JPS5695903A - Formation of high polymer film - Google Patents

Formation of high polymer film

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Publication number
JPS5695903A
JPS5695903A JP17252679A JP17252679A JPS5695903A JP S5695903 A JPS5695903 A JP S5695903A JP 17252679 A JP17252679 A JP 17252679A JP 17252679 A JP17252679 A JP 17252679A JP S5695903 A JPS5695903 A JP S5695903A
Authority
JP
Japan
Prior art keywords
container
light
sample
polymer film
wave length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17252679A
Other languages
Japanese (ja)
Inventor
Yasuaki Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP17252679A priority Critical patent/JPS5695903A/en
Publication of JPS5695903A publication Critical patent/JPS5695903A/en
Pending legal-status Critical Current

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  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: To form a high-purity and high-qnality photosensitive polymer film on a sample placed in a container, by irradiating of gaseous photopolymerizable monomer introduced into the container with a light of a specified wave length (ultraviolet light).
CONSTITUTION: A light from light source 3 is convented, by filter 4 placed on quartz window 2 of container 1 for photopolymerization, into a light having a wave length, causing only polymerization, but no decomposition, of a photopolymerizable monomer 6, 6' ( a low-molecular organic compound, forming a photosensitive polymer by polymerization), which is irradiated in the container 1. Sample 5 is placed on sample table 12 (symbol 13 represents a temperature controller), and said gaseous monomer 6, 6' is polymerized by irradiation with the light of said wave length, with the introduction of said monomer into the container 1 through flow controllers 8 and 8', and adhered to the sample 5, forming a photosensitive polymer film on the surface of the sample 5.
COPYRIGHT: (C)1981,JPO&Japio
JP17252679A 1979-12-28 1979-12-28 Formation of high polymer film Pending JPS5695903A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17252679A JPS5695903A (en) 1979-12-28 1979-12-28 Formation of high polymer film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17252679A JPS5695903A (en) 1979-12-28 1979-12-28 Formation of high polymer film

Publications (1)

Publication Number Publication Date
JPS5695903A true JPS5695903A (en) 1981-08-03

Family

ID=15943559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17252679A Pending JPS5695903A (en) 1979-12-28 1979-12-28 Formation of high polymer film

Country Status (1)

Country Link
JP (1) JPS5695903A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6157602A (en) * 1984-08-30 1986-03-24 Ulvac Corp Formation of polymer coating film by photopolymerization
JPS63245403A (en) * 1987-03-31 1988-10-12 Stanley Electric Co Ltd Plasma polymerization

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6157602A (en) * 1984-08-30 1986-03-24 Ulvac Corp Formation of polymer coating film by photopolymerization
JPS63245403A (en) * 1987-03-31 1988-10-12 Stanley Electric Co Ltd Plasma polymerization

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