JPS5582680A - Manufacture of thermal head - Google Patents

Manufacture of thermal head

Info

Publication number
JPS5582680A
JPS5582680A JP15732478A JP15732478A JPS5582680A JP S5582680 A JPS5582680 A JP S5582680A JP 15732478 A JP15732478 A JP 15732478A JP 15732478 A JP15732478 A JP 15732478A JP S5582680 A JPS5582680 A JP S5582680A
Authority
JP
Japan
Prior art keywords
conductive layer
heating
anode
heating resistance
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15732478A
Other languages
Japanese (ja)
Inventor
Takamichi Hattori
Masaji Arai
Keizaburo Kuramasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP15732478A priority Critical patent/JPS5582680A/en
Publication of JPS5582680A publication Critical patent/JPS5582680A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enable a production of a thermal head having a less difference in its height of component element so as to eliminate a short circuited condition or a dispersion of a size of the pattern not by a photo-eching of a heating resistance means but by making an insulative thin film under an oxidization of an anode.
CONSTITUTION: Heating resisting means 2 of Si-Ta etc. and conductive layer 3 of Cr-Au etc. are uniformly overlayed in sequence on an insulative base plate 1 of a glazed ceramic etc. Then, the conductive layer 3 formed on the heating resistance 2 is etched by a photo-etching process, the remained conductive layer 3 is oxidized by an anode of the heating resistance 2 as an anode, resulting in that the exposed heating resistance 2 is oxidized to form an insulative thin film 7. Then, the conductive layer is etched so as to form a heating part 5 in such a way as the layer passes across a circuit pattern of the conductive layer 3. A protective film 6 of SiC etc. is made by a spattering process etc. so as to cover portions of the heating part 5 and circuit pattern.
COPYRIGHT: (C)1980,JPO&Japio
JP15732478A 1978-12-19 1978-12-19 Manufacture of thermal head Pending JPS5582680A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15732478A JPS5582680A (en) 1978-12-19 1978-12-19 Manufacture of thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15732478A JPS5582680A (en) 1978-12-19 1978-12-19 Manufacture of thermal head

Publications (1)

Publication Number Publication Date
JPS5582680A true JPS5582680A (en) 1980-06-21

Family

ID=15647198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15732478A Pending JPS5582680A (en) 1978-12-19 1978-12-19 Manufacture of thermal head

Country Status (1)

Country Link
JP (1) JPS5582680A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0278556A (en) * 1988-06-17 1990-03-19 Canon Inc Substrate for ink jet recording head, ink jet recording head having that, and its manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0278556A (en) * 1988-06-17 1990-03-19 Canon Inc Substrate for ink jet recording head, ink jet recording head having that, and its manufacture

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