JPS5582680A - Manufacture of thermal head - Google Patents
Manufacture of thermal headInfo
- Publication number
- JPS5582680A JPS5582680A JP15732478A JP15732478A JPS5582680A JP S5582680 A JPS5582680 A JP S5582680A JP 15732478 A JP15732478 A JP 15732478A JP 15732478 A JP15732478 A JP 15732478A JP S5582680 A JPS5582680 A JP S5582680A
- Authority
- JP
- Japan
- Prior art keywords
- conductive layer
- heating
- anode
- heating resistance
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To enable a production of a thermal head having a less difference in its height of component element so as to eliminate a short circuited condition or a dispersion of a size of the pattern not by a photo-eching of a heating resistance means but by making an insulative thin film under an oxidization of an anode.
CONSTITUTION: Heating resisting means 2 of Si-Ta etc. and conductive layer 3 of Cr-Au etc. are uniformly overlayed in sequence on an insulative base plate 1 of a glazed ceramic etc. Then, the conductive layer 3 formed on the heating resistance 2 is etched by a photo-etching process, the remained conductive layer 3 is oxidized by an anode of the heating resistance 2 as an anode, resulting in that the exposed heating resistance 2 is oxidized to form an insulative thin film 7. Then, the conductive layer is etched so as to form a heating part 5 in such a way as the layer passes across a circuit pattern of the conductive layer 3. A protective film 6 of SiC etc. is made by a spattering process etc. so as to cover portions of the heating part 5 and circuit pattern.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15732478A JPS5582680A (en) | 1978-12-19 | 1978-12-19 | Manufacture of thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15732478A JPS5582680A (en) | 1978-12-19 | 1978-12-19 | Manufacture of thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5582680A true JPS5582680A (en) | 1980-06-21 |
Family
ID=15647198
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15732478A Pending JPS5582680A (en) | 1978-12-19 | 1978-12-19 | Manufacture of thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5582680A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0278556A (en) * | 1988-06-17 | 1990-03-19 | Canon Inc | Substrate for ink jet recording head, ink jet recording head having that, and its manufacture |
-
1978
- 1978-12-19 JP JP15732478A patent/JPS5582680A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0278556A (en) * | 1988-06-17 | 1990-03-19 | Canon Inc | Substrate for ink jet recording head, ink jet recording head having that, and its manufacture |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS53149041A (en) | Production of thermal head of thick type | |
JPS5582680A (en) | Manufacture of thermal head | |
JPS5235281A (en) | Peparation of flexible base for printed circuit | |
JPS529890A (en) | Conductive admixture | |
JPS5393845A (en) | Thermal heads manufacture | |
JPS5720374A (en) | Method of forming crossover in thermal head | |
JPS5266476A (en) | Temperature sensor | |
JPS5441741A (en) | Heat recording elements and manufacture of them | |
JPS53126270A (en) | Production of semiconductor devices | |
JPS57144770A (en) | Manufacture of thermal print head | |
JPS56123879A (en) | Thick film circuit substrate | |
JPS5219297A (en) | Method of manufacturing a metal film resistor | |
JPS535571A (en) | Circuit block and its manufacture | |
JPS5258464A (en) | Semiconductor device | |
JPS5699681A (en) | Preparation of thin film type thermal head | |
JPS5420675A (en) | Production of semiconductor device | |
JPS5440583A (en) | Semiconductor device | |
JPS533066A (en) | Electrode formation method | |
JPS5519837A (en) | Semiconductor container | |
JPS5247782A (en) | Method of detecting temperature hysteresis | |
JPS52153498A (en) | Gas sensitive element | |
JPS5327376A (en) | Forming method of high resistanc e layer | |
JPS5376398A (en) | Cylindrical magnetic-domain element | |
JPS54157349A (en) | Superficial exothermic material manufacturing method | |
JPS56117671A (en) | Manufacture of thermal head |