JPS5580314A - Manufacture of silicon semiconductor device - Google Patents

Manufacture of silicon semiconductor device

Info

Publication number
JPS5580314A
JPS5580314A JP15307378A JP15307378A JPS5580314A JP S5580314 A JPS5580314 A JP S5580314A JP 15307378 A JP15307378 A JP 15307378A JP 15307378 A JP15307378 A JP 15307378A JP S5580314 A JPS5580314 A JP S5580314A
Authority
JP
Japan
Prior art keywords
substrate
films
deposited
diffused
yielded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15307378A
Other languages
Japanese (ja)
Other versions
JPS5919461B2 (en
Inventor
Takayuki Wakui
Yasuhiro Mochizuki
Yutaka Misawa
Komei Yatsuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP53153073A priority Critical patent/JPS5919461B2/en
Publication of JPS5580314A publication Critical patent/JPS5580314A/en
Publication of JPS5919461B2 publication Critical patent/JPS5919461B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To prevent abnormal diffusion and to avoid deterioration of an SiO2 film which is provided on an Si substrate, by selectively depositing an Al diffused layer on the surface of the Si substrate, diffusing Al into the substrate by heat treatment, in a diffused atmosphere comtaining oxygen and free chlorine atoms.
CONSTITUTION: Photoresist films 2 with a specified pattern are deposited on upper and bottom surfaces of an n-type Si substrate 1, and etching is made, thereby a plurality of recesses 3 are formed in the substrate 1. Then, Al is deposited on the upper and lower surfaces of the substrate 1 by a vacuum evaporation method employing Al wire whose purity is 99.9995%, with the surfaces of the films 4 and the bottoms of the recesses 3 being separated. The films 2 and the films 4 which are deposited on the films 2, are removed. Then, Al in the films 4 is diffused by heat treatment in a mixed gas comprising 10% of oxygen including 1% of hydrogen- chloride gas and 90% of nitrogen, thereby a p-type separating regions 5 piercing the substrate 1 is formed. AT the same time, a diffusing-source remnants 6 are yielded on the surfaces of the regions 5, and SiO2 films 7 are yielded on the upper and bottom surfaces of the substrate. In this method, deterioration in film quality due to crystallization is not caused in the films 7.
COPYRIGHT: (C)1980,JPO&Japio
JP53153073A 1978-12-13 1978-12-13 Method for manufacturing silicon semiconductor devices Expired JPS5919461B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53153073A JPS5919461B2 (en) 1978-12-13 1978-12-13 Method for manufacturing silicon semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53153073A JPS5919461B2 (en) 1978-12-13 1978-12-13 Method for manufacturing silicon semiconductor devices

Publications (2)

Publication Number Publication Date
JPS5580314A true JPS5580314A (en) 1980-06-17
JPS5919461B2 JPS5919461B2 (en) 1984-05-07

Family

ID=15554380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53153073A Expired JPS5919461B2 (en) 1978-12-13 1978-12-13 Method for manufacturing silicon semiconductor devices

Country Status (1)

Country Link
JP (1) JPS5919461B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4542020A (en) * 1984-08-17 1985-09-17 E. R. Squibb & Sons, Inc. Long-lasting adhesive antifungal suppositories

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057776A (en) * 1973-09-17 1975-05-20

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057776A (en) * 1973-09-17 1975-05-20

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4542020A (en) * 1984-08-17 1985-09-17 E. R. Squibb & Sons, Inc. Long-lasting adhesive antifungal suppositories

Also Published As

Publication number Publication date
JPS5919461B2 (en) 1984-05-07

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