JPS5579867A - Vacuum evaporation method - Google Patents

Vacuum evaporation method

Info

Publication number
JPS5579867A
JPS5579867A JP15329278A JP15329278A JPS5579867A JP S5579867 A JPS5579867 A JP S5579867A JP 15329278 A JP15329278 A JP 15329278A JP 15329278 A JP15329278 A JP 15329278A JP S5579867 A JPS5579867 A JP S5579867A
Authority
JP
Japan
Prior art keywords
oil
metal
mask process
evaporation
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15329278A
Other languages
English (en)
Other versions
JPS5547113B2 (ja
Inventor
Yasuhiko Narumi
Yasuo Takahashi
Yoshihisa Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honshu Paper Co Ltd
Original Assignee
Honshu Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honshu Paper Co Ltd filed Critical Honshu Paper Co Ltd
Priority to JP15329278A priority Critical patent/JPS5579867A/ja
Publication of JPS5579867A publication Critical patent/JPS5579867A/ja
Publication of JPS5547113B2 publication Critical patent/JPS5547113B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Physical Vapour Deposition (AREA)
JP15329278A 1978-12-11 1978-12-11 Vacuum evaporation method Granted JPS5579867A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15329278A JPS5579867A (en) 1978-12-11 1978-12-11 Vacuum evaporation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15329278A JPS5579867A (en) 1978-12-11 1978-12-11 Vacuum evaporation method

Publications (2)

Publication Number Publication Date
JPS5579867A true JPS5579867A (en) 1980-06-16
JPS5547113B2 JPS5547113B2 (ja) 1980-11-27

Family

ID=15559279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15329278A Granted JPS5579867A (en) 1978-12-11 1978-12-11 Vacuum evaporation method

Country Status (1)

Country Link
JP (1) JPS5579867A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0073949A2 (de) * 1981-09-01 1983-03-16 Siemens Aktiengesellschaft Verfahren und Herstellung von metallfreien Streifen bei der Metallbedampfung eines Isolierstoffbandes und Vorrichtung zur Durchführung des Verfahrens
JPS5897823A (ja) * 1981-12-07 1983-06-10 松下電器産業株式会社 金属化フイルムコンデンサの製造方法
JPS637363A (ja) * 1986-06-25 1988-01-13 Kakogawa Plast Kk 真空蒸着方法
US4749591A (en) * 1985-07-03 1988-06-07 Metalvuoto Films S.P.A. Device for making metallized plastic films with clearly defined non-metallized areas
JPH11204371A (ja) * 1998-01-20 1999-07-30 Matsushita Electric Ind Co Ltd 薄膜積層体及び薄膜積層体の製造方法
US6576523B1 (en) 1997-11-18 2003-06-10 Matsushita Electric Industrial Co., Ltd. Layered product, capacitor and a method for producing the layered product

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57156608A (en) * 1981-03-20 1982-09-28 Nissin Electric Co Ltd Gas insulating switching device
JPS57156610A (en) * 1981-05-27 1982-09-28 Nissin Electric Co Ltd Gas insulating switching device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0073949A2 (de) * 1981-09-01 1983-03-16 Siemens Aktiengesellschaft Verfahren und Herstellung von metallfreien Streifen bei der Metallbedampfung eines Isolierstoffbandes und Vorrichtung zur Durchführung des Verfahrens
JPS5897823A (ja) * 1981-12-07 1983-06-10 松下電器産業株式会社 金属化フイルムコンデンサの製造方法
JPS6357932B2 (ja) * 1981-12-07 1988-11-14 Matsushita Electric Ind Co Ltd
US4749591A (en) * 1985-07-03 1988-06-07 Metalvuoto Films S.P.A. Device for making metallized plastic films with clearly defined non-metallized areas
JPS637363A (ja) * 1986-06-25 1988-01-13 Kakogawa Plast Kk 真空蒸着方法
JPH0359981B2 (ja) * 1986-06-25 1991-09-12 Kakogawa Purasuchitsukusu Kk
US6576523B1 (en) 1997-11-18 2003-06-10 Matsushita Electric Industrial Co., Ltd. Layered product, capacitor and a method for producing the layered product
US6838153B2 (en) 1997-11-18 2005-01-04 Matsushita Electric Industrial Co., Ltd. Layered product, capacitor and a method for producing the layered product
JPH11204371A (ja) * 1998-01-20 1999-07-30 Matsushita Electric Ind Co Ltd 薄膜積層体及び薄膜積層体の製造方法

Also Published As

Publication number Publication date
JPS5547113B2 (ja) 1980-11-27

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