JPS5570846A - Treating method of lithographic material not requiring dampening water - Google Patents
Treating method of lithographic material not requiring dampening waterInfo
- Publication number
- JPS5570846A JPS5570846A JP14424978A JP14424978A JPS5570846A JP S5570846 A JPS5570846 A JP S5570846A JP 14424978 A JP14424978 A JP 14424978A JP 14424978 A JP14424978 A JP 14424978A JP S5570846 A JPS5570846 A JP S5570846A
- Authority
- JP
- Japan
- Prior art keywords
- protecting film
- thickness
- lithographic material
- dampening water
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- 229920002379 silicone rubber Polymers 0.000 abstract 2
- 239000004945 silicone rubber Substances 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000000123 paper Substances 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000002985 plastic film Substances 0.000 abstract 1
- 229920006255 plastic film Polymers 0.000 abstract 1
- -1 polyethylene terephthalate Polymers 0.000 abstract 1
- 229920000139 polyethylene terephthalate Polymers 0.000 abstract 1
- 239000005020 polyethylene terephthalate Substances 0.000 abstract 1
- 229920000915 polyvinyl chloride Polymers 0.000 abstract 1
- 239000004800 polyvinyl chloride Substances 0.000 abstract 1
- 230000003252 repetitive effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14424978A JPS5570846A (en) | 1978-11-24 | 1978-11-24 | Treating method of lithographic material not requiring dampening water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14424978A JPS5570846A (en) | 1978-11-24 | 1978-11-24 | Treating method of lithographic material not requiring dampening water |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5570846A true JPS5570846A (en) | 1980-05-28 |
JPS6156507B2 JPS6156507B2 (enrdf_load_stackoverflow) | 1986-12-02 |
Family
ID=15357699
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14424978A Granted JPS5570846A (en) | 1978-11-24 | 1978-11-24 | Treating method of lithographic material not requiring dampening water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5570846A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5825635A (ja) * | 1981-08-10 | 1983-02-15 | Toray Ind Inc | 水なし平版印刷原板 |
JPS5952696A (ja) * | 1982-09-20 | 1984-03-27 | Toray Ind Inc | 湿し水不要平版印刷原版の製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4894503A (enrdf_load_stackoverflow) * | 1972-03-21 | 1973-12-05 | ||
JPS5287022A (en) * | 1975-11-03 | 1977-07-20 | Seal | Dry image duplicating laminate |
JPS52134504A (en) * | 1976-05-06 | 1977-11-10 | Fuji Photo Film Co Ltd | Photoosensitive lithographic printing plate material |
-
1978
- 1978-11-24 JP JP14424978A patent/JPS5570846A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4894503A (enrdf_load_stackoverflow) * | 1972-03-21 | 1973-12-05 | ||
JPS5287022A (en) * | 1975-11-03 | 1977-07-20 | Seal | Dry image duplicating laminate |
JPS52134504A (en) * | 1976-05-06 | 1977-11-10 | Fuji Photo Film Co Ltd | Photoosensitive lithographic printing plate material |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5825635A (ja) * | 1981-08-10 | 1983-02-15 | Toray Ind Inc | 水なし平版印刷原板 |
JPS5952696A (ja) * | 1982-09-20 | 1984-03-27 | Toray Ind Inc | 湿し水不要平版印刷原版の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6156507B2 (enrdf_load_stackoverflow) | 1986-12-02 |
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