JPS5568059A - Automatic position setter for reflective electron beam detector in scanning electronic microscope - Google Patents

Automatic position setter for reflective electron beam detector in scanning electronic microscope

Info

Publication number
JPS5568059A
JPS5568059A JP14174278A JP14174278A JPS5568059A JP S5568059 A JPS5568059 A JP S5568059A JP 14174278 A JP14174278 A JP 14174278A JP 14174278 A JP14174278 A JP 14174278A JP S5568059 A JPS5568059 A JP S5568059A
Authority
JP
Japan
Prior art keywords
electron beam
detector
specimen
beam detector
electronic microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14174278A
Other languages
Japanese (ja)
Inventor
Toshiyuki Uemae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP14174278A priority Critical patent/JPS5568059A/en
Publication of JPS5568059A publication Critical patent/JPS5568059A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To optimize the picture quality of the image of specimen, by controlling the movement of detecting means such that integrated value of signal from detecting means is maximized.
CONSTITUTION: Electron beam EB from electron gun 3 is focused by focusing lenzs 4, 5 and irradiated on the specimen 6. The detector 9 detects the reflected electron beam E produced from the specimen 6. Said output is supplied through amplifier 10 to the integrator 14 and integrated. The integrated value is supplied through A/D converter 15 to the shift register 16 to be stored temporarily. The detector moving mechanism 13 is controlled on the basis of max. value in the shift register 16 to set the detector 9 at the peak position of average strength distribution of reflected electron beam.
COPYRIGHT: (C)1980,JPO&Japio
JP14174278A 1978-11-17 1978-11-17 Automatic position setter for reflective electron beam detector in scanning electronic microscope Pending JPS5568059A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14174278A JPS5568059A (en) 1978-11-17 1978-11-17 Automatic position setter for reflective electron beam detector in scanning electronic microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14174278A JPS5568059A (en) 1978-11-17 1978-11-17 Automatic position setter for reflective electron beam detector in scanning electronic microscope

Publications (1)

Publication Number Publication Date
JPS5568059A true JPS5568059A (en) 1980-05-22

Family

ID=15299138

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14174278A Pending JPS5568059A (en) 1978-11-17 1978-11-17 Automatic position setter for reflective electron beam detector in scanning electronic microscope

Country Status (1)

Country Link
JP (1) JPS5568059A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS613662U (en) * 1984-06-12 1986-01-10 日本電子株式会社 Secondary electron detection device
WO2012026291A1 (en) * 2010-08-24 2012-03-01 株式会社 日立ハイテクノロジーズ Charged particle beam device and sample observation method
JP2016024900A (en) * 2014-07-17 2016-02-08 日本電子株式会社 Radiation analyzer

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS613662U (en) * 1984-06-12 1986-01-10 日本電子株式会社 Secondary electron detection device
JPH0535558Y2 (en) * 1984-06-12 1993-09-09
WO2012026291A1 (en) * 2010-08-24 2012-03-01 株式会社 日立ハイテクノロジーズ Charged particle beam device and sample observation method
JP2012048819A (en) * 2010-08-24 2012-03-08 Hitachi High-Technologies Corp Charged particle beam device and sample observation method
EP2610891A1 (en) * 2010-08-24 2013-07-03 Hitachi High-Technologies Corporation Charged particle beam device and sample observation method
US8791413B2 (en) 2010-08-24 2014-07-29 Hitachi High-Technologies Corporation Charged particle beam device and sample observation method using a rotating detector
EP2610891A4 (en) * 2010-08-24 2015-01-14 Hitachi High Tech Corp Charged particle beam device and sample observation method
JP2016024900A (en) * 2014-07-17 2016-02-08 日本電子株式会社 Radiation analyzer

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