JPS5558359A - Preparation of transparent conductive film - Google Patents

Preparation of transparent conductive film

Info

Publication number
JPS5558359A
JPS5558359A JP13134578A JP13134578A JPS5558359A JP S5558359 A JPS5558359 A JP S5558359A JP 13134578 A JP13134578 A JP 13134578A JP 13134578 A JP13134578 A JP 13134578A JP S5558359 A JPS5558359 A JP S5558359A
Authority
JP
Japan
Prior art keywords
substrate
transparent conductive
preparation
conductive film
baking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13134578A
Other languages
Japanese (ja)
Other versions
JPS5814873B2 (en
Inventor
Kaname Miyazawa
Bunkichi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP13134578A priority Critical patent/JPS5814873B2/en
Publication of JPS5558359A publication Critical patent/JPS5558359A/en
Publication of JPS5814873B2 publication Critical patent/JPS5814873B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material

Abstract

PURPOSE:To manufacture a stable low resistance transparent conductive flim at low prices, by applying tin alcoholate on the substrate and baking. CONSTITUTION:Tin alcoholate shown in the general formula Sn(OR)2 (R; alkyl of C1-20 of straight or side chain), is applied on the substrate using only or dissolving in a suitable solvent. Or, antimony alcoholate shown in the general formula Sb(OR)3 or Sb(OR)5 (R: the same to the above mentioned alkyl), is added in the extent of 0.01-20wt% against Sn(OR)2 and is dissolved in the solvent and then, is applied on the substrate. Transparent electrode is formed on the substrate by drying at 100-150 deg.C and moreover, baking in the air atmosphere at 200-600 deg.C.
JP13134578A 1978-10-25 1978-10-25 Method for manufacturing transparent conductive film Expired JPS5814873B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13134578A JPS5814873B2 (en) 1978-10-25 1978-10-25 Method for manufacturing transparent conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13134578A JPS5814873B2 (en) 1978-10-25 1978-10-25 Method for manufacturing transparent conductive film

Publications (2)

Publication Number Publication Date
JPS5558359A true JPS5558359A (en) 1980-05-01
JPS5814873B2 JPS5814873B2 (en) 1983-03-22

Family

ID=15055759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13134578A Expired JPS5814873B2 (en) 1978-10-25 1978-10-25 Method for manufacturing transparent conductive film

Country Status (1)

Country Link
JP (1) JPS5814873B2 (en)

Also Published As

Publication number Publication date
JPS5814873B2 (en) 1983-03-22

Similar Documents

Publication Publication Date Title
SE7907856L (en) ELECTRICAL FOR ELECTRICAL LIGHTING AND MANUFACTURING THEREOF
ES374540A1 (en) Electrodes for electrochemical cells
JP2001097747A5 (en)
JPS5558359A (en) Preparation of transparent conductive film
JPS5421969A (en) Method of manufacturing insoluble electrode
JPS5477286A (en) Manufacture of insoluble electrode
JPS5510466A (en) Production of transparent electrically conductive film
JPS54103694A (en) Production of transparent conductive film patterns of liquid crystal panel
JPS5425594A (en) Electric discharge processor
JPS53147549A (en) Forming method of antireflection film
JPS6486412A (en) Manufacture of transparent conductive thin film
CA2142418A1 (en) Electrically conductive transparent doped tin oxide films
JPS5499449A (en) Roduction of liquid crystal display element
JPS5237784A (en) Photovoltaic element
JPS5425493A (en) Manufacture of transparent conductive film
JPS54134396A (en) Transparent conductive film and its manufacturing process
JPS5543575A (en) Electrochromic display device
JPS5661175A (en) Thin-film solar cell
JPS5555579A (en) Semiconductor device and method of fabricating the same
JPS5687020A (en) Production of liquid crystal orientation film
JPS57191620A (en) Electrochromic display device
JPS5752024A (en) Manufacture of transparent electrode substrate
JPS54126557A (en) Electrochromic display element
JPS5411674A (en) Semiconductor device of mesa type
JPS5479494A (en) Thick film varister