JPS5558359A - Preparation of transparent conductive film - Google Patents
Preparation of transparent conductive filmInfo
- Publication number
- JPS5558359A JPS5558359A JP13134578A JP13134578A JPS5558359A JP S5558359 A JPS5558359 A JP S5558359A JP 13134578 A JP13134578 A JP 13134578A JP 13134578 A JP13134578 A JP 13134578A JP S5558359 A JPS5558359 A JP S5558359A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- transparent conductive
- preparation
- conductive film
- baking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
Abstract
PURPOSE:To manufacture a stable low resistance transparent conductive flim at low prices, by applying tin alcoholate on the substrate and baking. CONSTITUTION:Tin alcoholate shown in the general formula Sn(OR)2 (R; alkyl of C1-20 of straight or side chain), is applied on the substrate using only or dissolving in a suitable solvent. Or, antimony alcoholate shown in the general formula Sb(OR)3 or Sb(OR)5 (R: the same to the above mentioned alkyl), is added in the extent of 0.01-20wt% against Sn(OR)2 and is dissolved in the solvent and then, is applied on the substrate. Transparent electrode is formed on the substrate by drying at 100-150 deg.C and moreover, baking in the air atmosphere at 200-600 deg.C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13134578A JPS5814873B2 (en) | 1978-10-25 | 1978-10-25 | Method for manufacturing transparent conductive film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13134578A JPS5814873B2 (en) | 1978-10-25 | 1978-10-25 | Method for manufacturing transparent conductive film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5558359A true JPS5558359A (en) | 1980-05-01 |
JPS5814873B2 JPS5814873B2 (en) | 1983-03-22 |
Family
ID=15055759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13134578A Expired JPS5814873B2 (en) | 1978-10-25 | 1978-10-25 | Method for manufacturing transparent conductive film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5814873B2 (en) |
-
1978
- 1978-10-25 JP JP13134578A patent/JPS5814873B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5814873B2 (en) | 1983-03-22 |
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