JPS5554562A - Vapor deposition method - Google Patents

Vapor deposition method

Info

Publication number
JPS5554562A
JPS5554562A JP12590578A JP12590578A JPS5554562A JP S5554562 A JPS5554562 A JP S5554562A JP 12590578 A JP12590578 A JP 12590578A JP 12590578 A JP12590578 A JP 12590578A JP S5554562 A JPS5554562 A JP S5554562A
Authority
JP
Japan
Prior art keywords
alumina
sno2
powdered
sublimation
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12590578A
Other languages
Japanese (ja)
Inventor
Giichi Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12590578A priority Critical patent/JPS5554562A/en
Publication of JPS5554562A publication Critical patent/JPS5554562A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To sharply shorten the usual heating time of sublimation material, by mixing powdered sublimation substance with powdered alumina having higher sublimation temperature and heat conductivity than the above substance and evaporating by heating. CONSTITUTION:Powdered alumina is mixed with sublimation evaporating material, for example, powdered SnO2 6 and the mixture is charged in the boat 3 in the vacuum vessel 2 and then is heated and moreover, SnO2 6 is evaporated on the glass substrate 5. On this occasion, more rapid heating is able to carry out than the case of exsisting alumina only making alumina as heating medium at the time of heating, because alumina is possessed about 1.5 times of heat conductivity of SnO2 and about 2000 deg.C of high melting point and also is not reacted with SnO2. Also, by the above method, scattering by unexpeted sublimation is able to prevent at the time of rapid heating of only powdered SnO2. Further, powdered alumina left behind as it is because alumina is stable at the sublimation temperature of SnO2.
JP12590578A 1978-10-13 1978-10-13 Vapor deposition method Pending JPS5554562A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12590578A JPS5554562A (en) 1978-10-13 1978-10-13 Vapor deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12590578A JPS5554562A (en) 1978-10-13 1978-10-13 Vapor deposition method

Publications (1)

Publication Number Publication Date
JPS5554562A true JPS5554562A (en) 1980-04-21

Family

ID=14921803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12590578A Pending JPS5554562A (en) 1978-10-13 1978-10-13 Vapor deposition method

Country Status (1)

Country Link
JP (1) JPS5554562A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006023046A1 (en) * 2006-05-17 2007-11-22 Infineon Technologies Ag Method, apparatus and starting material for providing a gaseous precursor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006023046A1 (en) * 2006-05-17 2007-11-22 Infineon Technologies Ag Method, apparatus and starting material for providing a gaseous precursor
DE102006023046B4 (en) * 2006-05-17 2009-02-05 Qimonda Ag Method and starting material for providing a gaseous precursor

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