JPS5550639A - Preparation of semiconductor device - Google Patents

Preparation of semiconductor device

Info

Publication number
JPS5550639A
JPS5550639A JP12366078A JP12366078A JPS5550639A JP S5550639 A JPS5550639 A JP S5550639A JP 12366078 A JP12366078 A JP 12366078A JP 12366078 A JP12366078 A JP 12366078A JP S5550639 A JPS5550639 A JP S5550639A
Authority
JP
Japan
Prior art keywords
region
unit
sio
distortion
pellet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12366078A
Other languages
English (en)
Other versions
JPS6145860B2 (ja
Inventor
Kazuo Endo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12366078A priority Critical patent/JPS5550639A/ja
Publication of JPS5550639A publication Critical patent/JPS5550639A/ja
Publication of JPS6145860B2 publication Critical patent/JPS6145860B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Local Oxidation Of Silicon (AREA)
JP12366078A 1978-10-09 1978-10-09 Preparation of semiconductor device Granted JPS5550639A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12366078A JPS5550639A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12366078A JPS5550639A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5550639A true JPS5550639A (en) 1980-04-12
JPS6145860B2 JPS6145860B2 (ja) 1986-10-09

Family

ID=14866117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12366078A Granted JPS5550639A (en) 1978-10-09 1978-10-09 Preparation of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5550639A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6286826A (ja) * 1985-10-14 1987-04-21 Mitsubishi Electric Corp 半導体装置の製造方法
JPS62262820A (ja) * 1986-05-09 1987-11-14 Hamamatsu Photonics Kk 立体視テレビジヨン顕微鏡

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140572A (en) * 1975-05-30 1976-12-03 Nec Corp Semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51140572A (en) * 1975-05-30 1976-12-03 Nec Corp Semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6286826A (ja) * 1985-10-14 1987-04-21 Mitsubishi Electric Corp 半導体装置の製造方法
JPS62262820A (ja) * 1986-05-09 1987-11-14 Hamamatsu Photonics Kk 立体視テレビジヨン顕微鏡

Also Published As

Publication number Publication date
JPS6145860B2 (ja) 1986-10-09

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