JPS5539382A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPS5539382A
JPS5539382A JP11332978A JP11332978A JPS5539382A JP S5539382 A JPS5539382 A JP S5539382A JP 11332978 A JP11332978 A JP 11332978A JP 11332978 A JP11332978 A JP 11332978A JP S5539382 A JPS5539382 A JP S5539382A
Authority
JP
Japan
Prior art keywords
film
sio
chemical resistance
insulating substrate
thermal head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11332978A
Other languages
Japanese (ja)
Inventor
Masao Mashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11332978A priority Critical patent/JPS5539382A/en
Publication of JPS5539382A publication Critical patent/JPS5539382A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To obtain a thermal head with excellent chemical resistance, stable thermal response, and high reliability, which is easy to manufacture and is cheap, by forming a heating resistor and electrodes connected to the resistor on an insulating substrate that has a specified thermal conductivity.
CONSTITUTION: The thermal head as the object is gained in such a manner that a heating resistor 13 of a Ta-SiO2 thermet film, etc. and the electrodes 14, 15 of an Au/Cu film, etc. are directly made up on an insulating substrate 11 consisting of a material, with thermal conductivity of 0.03W0.005Cal/cm.sec.°C near room temperature, such as forsterite (2MgO.SiO2), etc., and a wear-proof film 16 of TaOs/ SiO2, etc. is built up on the electrodes. When the material of the insulating substrate lacks chemical resistance, it is desirable that an insulator protective film 12 with excellent chemical resistance is attached on the substrate in the thickness of 0.1W 1μm.
COPYRIGHT: (C)1980,JPO&Japio
JP11332978A 1978-09-14 1978-09-14 Thermal head Pending JPS5539382A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11332978A JPS5539382A (en) 1978-09-14 1978-09-14 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11332978A JPS5539382A (en) 1978-09-14 1978-09-14 Thermal head

Publications (1)

Publication Number Publication Date
JPS5539382A true JPS5539382A (en) 1980-03-19

Family

ID=14609474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11332978A Pending JPS5539382A (en) 1978-09-14 1978-09-14 Thermal head

Country Status (1)

Country Link
JP (1) JPS5539382A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4595823A (en) * 1983-03-17 1986-06-17 Fujitsu Limited Thermal printing head with an anti-abrasion layer and method of fabricating the same
JPH04551U (en) * 1990-04-13 1992-01-06

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4595823A (en) * 1983-03-17 1986-06-17 Fujitsu Limited Thermal printing head with an anti-abrasion layer and method of fabricating the same
JPH04551U (en) * 1990-04-13 1992-01-06

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