JPS553622A - Electronic beam exposure device - Google Patents

Electronic beam exposure device

Info

Publication number
JPS553622A
JPS553622A JP7460078A JP7460078A JPS553622A JP S553622 A JPS553622 A JP S553622A JP 7460078 A JP7460078 A JP 7460078A JP 7460078 A JP7460078 A JP 7460078A JP S553622 A JPS553622 A JP S553622A
Authority
JP
Japan
Prior art keywords
specimine
electronic beam
opening
decelerating
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7460078A
Other languages
Japanese (ja)
Other versions
JPS5622364B2 (en
Inventor
Tateaki Sasaki
Hidekazu Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP7460078A priority Critical patent/JPS553622A/en
Publication of JPS553622A publication Critical patent/JPS553622A/en
Publication of JPS5622364B2 publication Critical patent/JPS5622364B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To reduce the shade-off around the projected image caused by the interaction of space charges by accelerating an electronic beam at high temperatures around exposure materials and by decelerating the electronic beam at the close proximity of the exposure materials by the use of decelerating electrodes. CONSTITUTION:An electronic beam from an electronic beam source G is focussed by a focusing lens L0, passed through an opening in a mask M1, and deflected by a deflecting means D1. Then, after the beam is again passed through an opening in a mask M2, it is focussed by a lens L2, deflected by a deflecting means D2, and illuminated on a specimine W. In this constitution, accelerating electrodes are provided adjacent to the masks M1 and M2 on the path of the beam to the specimine W, and decelerating electrodes E with an opening is additionally provided over the specimine, whereby an electric field opposite to the acceleating field is given to decelerate the beam. In this way, the beam which will not generate backward scattering or secondary electrons is formed and illuminates the specimine W. As a result, the shape of the beam-cross section becomes sharp and shade-off is not generated.
JP7460078A 1978-06-20 1978-06-20 Electronic beam exposure device Granted JPS553622A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7460078A JPS553622A (en) 1978-06-20 1978-06-20 Electronic beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7460078A JPS553622A (en) 1978-06-20 1978-06-20 Electronic beam exposure device

Publications (2)

Publication Number Publication Date
JPS553622A true JPS553622A (en) 1980-01-11
JPS5622364B2 JPS5622364B2 (en) 1981-05-25

Family

ID=13551803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7460078A Granted JPS553622A (en) 1978-06-20 1978-06-20 Electronic beam exposure device

Country Status (1)

Country Link
JP (1) JPS553622A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59198721A (en) * 1983-04-26 1984-11-10 Toshiba Corp Electron beam drawing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59198721A (en) * 1983-04-26 1984-11-10 Toshiba Corp Electron beam drawing device

Also Published As

Publication number Publication date
JPS5622364B2 (en) 1981-05-25

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