JPS5534929B2 - - Google Patents
Info
- Publication number
- JPS5534929B2 JPS5534929B2 JP2394074A JP2394074A JPS5534929B2 JP S5534929 B2 JPS5534929 B2 JP S5534929B2 JP 2394074 A JP2394074 A JP 2394074A JP 2394074 A JP2394074 A JP 2394074A JP S5534929 B2 JPS5534929 B2 JP S5534929B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2394074A JPS5534929B2 (US20030220297A1-20031127-C00033.png) | 1974-02-28 | 1974-02-28 | |
| GB813175A GB1505739A (en) | 1974-02-28 | 1975-02-26 | Photosensitive composition |
| CA221,185A CA1060252A (en) | 1974-02-28 | 1975-02-27 | Photosensitive composition containing diazo compound and copolymer |
| DE19752508618 DE2508618C2 (de) | 1974-02-28 | 1975-02-27 | Lichtempfindliches Gemisch |
| FR7506415A FR2262813B1 (US20030220297A1-20031127-C00033.png) | 1974-02-28 | 1975-02-28 | |
| US05/760,371 US4123276A (en) | 1974-02-28 | 1977-01-18 | Photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2394074A JPS5534929B2 (US20030220297A1-20031127-C00033.png) | 1974-02-28 | 1974-02-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50118802A JPS50118802A (US20030220297A1-20031127-C00033.png) | 1975-09-17 |
| JPS5534929B2 true JPS5534929B2 (US20030220297A1-20031127-C00033.png) | 1980-09-10 |
Family
ID=12124516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2394074A Expired JPS5534929B2 (US20030220297A1-20031127-C00033.png) | 1974-02-28 | 1974-02-28 |
Country Status (5)
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS533216A (en) * | 1976-06-28 | 1978-01-12 | Fuji Photo Film Co Ltd | Diazo photosensitive composition |
| JPS5498613A (en) * | 1978-01-09 | 1979-08-03 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
| JPS5552054A (en) * | 1978-10-11 | 1980-04-16 | Konishiroku Photo Ind Co Ltd | Developing solution composition |
| JPS564144A (en) * | 1979-06-23 | 1981-01-17 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
| CA1153611A (en) * | 1980-04-30 | 1983-09-13 | Minnesota Mining And Manufacturing Company | Aqueous developable photosensitive composition and printing plate |
| JPS5964396A (ja) * | 1982-10-05 | 1984-04-12 | Fuji Photo Film Co Ltd | 平版印刷版用版面保護剤 |
| JPS60217356A (ja) * | 1984-04-13 | 1985-10-30 | Asahi Chem Ind Co Ltd | 感光性組成物 |
| JP2550346B2 (ja) * | 1987-05-18 | 1996-11-06 | 光陽化学工業株式会社 | 平版製版用感光性組成物 |
| FR2651337B1 (fr) * | 1989-08-31 | 1991-12-06 | Efi | Composition photosensible a base de condensat diazouique pour plaques offset. |
| JPH03125151A (ja) * | 1989-10-11 | 1991-05-28 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| JPH03148662A (ja) * | 1989-11-03 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| JPH03148663A (ja) * | 1989-11-03 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| DE4430680A1 (de) * | 1994-08-29 | 1996-03-07 | Hoechst Ag | Lichtempfindliches Gemisch |
| JP2815332B2 (ja) * | 1995-12-18 | 1998-10-27 | 旭化成工業株式会社 | 感光性組成物の製造方法 |
| JP4458389B2 (ja) | 2000-05-01 | 2010-04-28 | コダック株式会社 | 感光性組成物および感光性平版印刷版 |
| JP4410714B2 (ja) | 2004-08-13 | 2010-02-03 | 富士フイルム株式会社 | 平版印刷版用支持体の製造方法 |
| JP4499507B2 (ja) | 2004-08-23 | 2010-07-07 | コダック株式会社 | 平版印刷版原版 |
| DE602006001142D1 (de) | 2005-04-13 | 2008-06-26 | Fujifilm Corp | Verfahren zur Herstellung eines Flachdruckplattenträgers |
| JP5165197B2 (ja) * | 2005-12-12 | 2013-03-21 | 岡本化学工業株式会社 | 平版印刷版用捨版およびその製造方法 |
| EP2042338A3 (en) | 2007-09-26 | 2010-03-10 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| EP2042339B1 (en) | 2007-09-26 | 2013-05-22 | FUJIFILM Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
| JP2009208140A (ja) | 2008-03-06 | 2009-09-17 | Fujifilm Corp | 平版印刷版用アルミニウム合金板の製造方法、ならびに該製造方法により得られる平版印刷版用アルミニウム合金板および平版印刷版用支持体 |
| JP2009234247A (ja) | 2008-03-07 | 2009-10-15 | Fujifilm Corp | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
| JP5288268B2 (ja) | 2009-03-25 | 2013-09-11 | 富士フイルム株式会社 | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
| JP5281130B2 (ja) | 2011-07-05 | 2013-09-04 | 富士フイルム株式会社 | 平版印刷用湿し水組成物 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2034654C2 (de) * | 1970-07-13 | 1982-08-26 | Hoechst Ag, 6000 Frankfurt | Negativ arbeitende Kopierlösung und deren Verwendung zur Herstellung von Druckplatten |
| IT948621B (it) * | 1971-02-19 | 1973-06-11 | Howson Algraphy Ltd | Procedimento per produrre lastre da stampa litografica e lastre cosi ottenute |
-
1974
- 1974-02-28 JP JP2394074A patent/JPS5534929B2/ja not_active Expired
-
1975
- 1975-02-26 GB GB813175A patent/GB1505739A/en not_active Expired
- 1975-02-27 CA CA221,185A patent/CA1060252A/en not_active Expired
- 1975-02-27 DE DE19752508618 patent/DE2508618C2/de not_active Expired
- 1975-02-28 FR FR7506415A patent/FR2262813B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50118802A (US20030220297A1-20031127-C00033.png) | 1975-09-17 |
| FR2262813A1 (US20030220297A1-20031127-C00033.png) | 1975-09-26 |
| DE2508618C2 (de) | 1984-01-26 |
| FR2262813B1 (US20030220297A1-20031127-C00033.png) | 1977-04-15 |
| DE2508618A1 (de) | 1975-09-04 |
| GB1505739A (en) | 1978-03-30 |
| CA1060252A (en) | 1979-08-14 |
