JPS5530208B2 - - Google Patents

Info

Publication number
JPS5530208B2
JPS5530208B2 JP14195173A JP14195173A JPS5530208B2 JP S5530208 B2 JPS5530208 B2 JP S5530208B2 JP 14195173 A JP14195173 A JP 14195173A JP 14195173 A JP14195173 A JP 14195173A JP S5530208 B2 JPS5530208 B2 JP S5530208B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14195173A
Other versions
JPS49103632A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49103632A publication Critical patent/JPS49103632A/ja
Publication of JPS5530208B2 publication Critical patent/JPS5530208B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP14195173A 1972-12-21 1973-12-20 Expired JPS5530208B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5906372A GB1445345A (en) 1972-12-21 1972-12-21 Positive-working electron resists

Publications (2)

Publication Number Publication Date
JPS49103632A JPS49103632A (ja) 1974-10-01
JPS5530208B2 true JPS5530208B2 (ja) 1980-08-09

Family

ID=10482994

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14195173A Expired JPS5530208B2 (ja) 1972-12-21 1973-12-20

Country Status (5)

Country Link
US (1) US3981985A (ja)
JP (1) JPS5530208B2 (ja)
DE (1) DE2363092C2 (ja)
FR (1) FR2211489B1 (ja)
GB (1) GB1445345A (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1500541A (en) * 1975-03-20 1978-02-08 Mullard Ltd Method of producing positive-working electron resist coatings
US4004043A (en) * 1975-09-26 1977-01-18 International Business Machines Corporation Nitrated polymers as positive resists
JPS52128132A (en) * 1976-04-20 1977-10-27 Fujitsu Ltd Positive type electron beam sensitive composition
US4096290A (en) * 1976-10-04 1978-06-20 International Business Machines Corporation Resist mask formation process with haloalkyl methacrylate copolymers
JPS5466122A (en) * 1977-11-07 1979-05-28 Fujitsu Ltd Pattern formation material
JPS5466829A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Pattern formation materil
JPS5471579A (en) * 1977-11-17 1979-06-08 Matsushita Electric Ind Co Ltd Electron beam resist
DE2757931A1 (de) * 1977-12-24 1979-07-12 Licentia Gmbh Verfahren zum herstellen von positiven aetzresistenten masken
DE2757932A1 (de) * 1977-12-24 1979-07-05 Licentia Gmbh Strahlungsempfindliche positiv arbeitende materialien
JPS54118776A (en) * 1978-03-08 1979-09-14 Fujitsu Ltd Pattern forming method
JPS54158173A (en) * 1978-06-05 1979-12-13 Fujitsu Ltd Micropattern forming method
JPS54161320A (en) * 1978-06-12 1979-12-20 Fujitsu Ltd Production of cross linking type resist
JPS5590942A (en) * 1978-12-29 1980-07-10 Fujitsu Ltd Positive type resist material
JPS55117239A (en) * 1979-03-02 1980-09-09 Fujitsu Ltd Making method of microminiature pattern
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
US4276365A (en) * 1979-07-02 1981-06-30 Fujitsu Limited Positive resist terpolymer composition and method of forming resist pattern
US4286518A (en) * 1979-07-25 1981-09-01 Armstrong World Industries, Inc. Print screen stencil
US5391624A (en) * 1992-02-10 1995-02-21 S. C. Johnson & Son, Inc. Thermosettable compositions

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1141175A (en) * 1964-02-20 1969-01-29 Monsanto Chemicals Aromatic polymers containing anhydride groups
US3445530A (en) * 1965-05-14 1969-05-20 Marathon Oil Co Nitroso compounds and processes for their production
US3535137A (en) * 1967-01-13 1970-10-20 Ibm Method of fabricating etch resistant masks
US3546182A (en) * 1967-12-18 1970-12-08 Sumitomo Electric Industries Liner polymeric compositions,method of manufacturing them and products made from them
US3526612A (en) * 1969-04-16 1970-09-01 Marathon Oil Co Polyanhydrides,and processes for their production

Also Published As

Publication number Publication date
US3981985A (en) 1976-09-21
JPS49103632A (ja) 1974-10-01
FR2211489A1 (ja) 1974-07-19
DE2363092C2 (de) 1982-11-25
DE2363092A1 (de) 1974-07-04
GB1445345A (en) 1976-08-11
FR2211489B1 (ja) 1976-11-19

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