JPS5524985A - Equipment for producing microparticle film - Google Patents
Equipment for producing microparticle filmInfo
- Publication number
- JPS5524985A JPS5524985A JP9922478A JP9922478A JPS5524985A JP S5524985 A JPS5524985 A JP S5524985A JP 9922478 A JP9922478 A JP 9922478A JP 9922478 A JP9922478 A JP 9922478A JP S5524985 A JPS5524985 A JP S5524985A
- Authority
- JP
- Japan
- Prior art keywords
- boat
- gas
- barrier
- substrate
- microparticles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
PURPOSE:To provide uniform microparticle film on a substrate in vacuum deposition, the substrate is located beneath a microparticle evaporator, and barriers are located above the evaporator so that convection of microparticles and gas is made uniform with respect to the substrate. CONSTITUTION:The vacuum container 11 is provided with boat 12 containing evaporating material 17 such as Sn, below which substrates 13, 14 to be deposited with film are located. The first barrier 15 is located above the boat 12, and the second barrier 16 between the boat 12 and the substatrates 13, 14. The vacuum container 11 is evacuated through the outlet 19 and Ar gas etc. is introduced through the gas inlet 18. Then, current is fed to the boat 12 to evaporate material 17. Evaporated atoms and argon gas collide to form microparticles and deposit on the surface of the substrates. Preferably, the barrier 15 is heated to direct microparticles and gas flow downward regardless of boat strucuture and operation temperature.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9922478A JPS5524985A (en) | 1978-08-14 | 1978-08-14 | Equipment for producing microparticle film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9922478A JPS5524985A (en) | 1978-08-14 | 1978-08-14 | Equipment for producing microparticle film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5524985A true JPS5524985A (en) | 1980-02-22 |
Family
ID=14241683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9922478A Pending JPS5524985A (en) | 1978-08-14 | 1978-08-14 | Equipment for producing microparticle film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5524985A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58188540A (en) * | 1982-04-30 | 1983-11-04 | Aisin Chem Co Ltd | Resin coated sand grain |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5120083A (en) * | 1974-08-12 | 1976-02-17 | Nippon Electric Co | SHINKUJOCHAKUHOHO |
JPS5110350B1 (en) * | 1970-09-04 | 1976-04-03 | ||
JPS51107286A (en) * | 1975-03-18 | 1976-09-22 | Mitsubishi Electric Corp | JOCHAKUSOCHI |
JPS5262138A (en) * | 1975-11-18 | 1977-05-23 | Shimadzu Corp | Vacuum deposition process |
-
1978
- 1978-08-14 JP JP9922478A patent/JPS5524985A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5110350B1 (en) * | 1970-09-04 | 1976-04-03 | ||
JPS5120083A (en) * | 1974-08-12 | 1976-02-17 | Nippon Electric Co | SHINKUJOCHAKUHOHO |
JPS51107286A (en) * | 1975-03-18 | 1976-09-22 | Mitsubishi Electric Corp | JOCHAKUSOCHI |
JPS5262138A (en) * | 1975-11-18 | 1977-05-23 | Shimadzu Corp | Vacuum deposition process |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58188540A (en) * | 1982-04-30 | 1983-11-04 | Aisin Chem Co Ltd | Resin coated sand grain |
JPH0123222B2 (en) * | 1982-04-30 | 1989-05-01 | Aishin Kako Kk |
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