JPS5782471A - Formation of thin film - Google Patents
Formation of thin filmInfo
- Publication number
- JPS5782471A JPS5782471A JP15656080A JP15656080A JPS5782471A JP S5782471 A JPS5782471 A JP S5782471A JP 15656080 A JP15656080 A JP 15656080A JP 15656080 A JP15656080 A JP 15656080A JP S5782471 A JPS5782471 A JP S5782471A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- vapor deposition
- opening
- thin film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To effectively avoid the occurrence of a cutting incident of a formed thin film, etc. by linking an evaporation chamber and a vapor deposition chamber together through a small opening and making the vaccum degree of the former chamber higher than that of the latter chamber. CONSTITUTION:An evaporation chamber 11 and a vapor deposition chamber 12 are separated from each other, and they are linked together through an opening 12b made in a partition wall 12a. The chamber 11 is evacuated to about 10<-5> Torr vacuum degree, and the chamber 12 to about 10<-2> Torr vacuum degree. After regulating the internal pressures of the chambers 11, 12, a substance 13 for vapor deposition in the chamber 11 is evaporated by an ordinary method. The evaporated particles enter the chamber 12 through the opening 12b, hit on the atmospheric gas in the chamber 12, and deposit on a substrate 14 from many directions. Thus, a vapor deposited film having a uniform thickness is formed even if the surface of the substrate 14 is uneven. By this method the breaking of Al wiring, etc. can be prevented perfectly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15656080A JPS5782471A (en) | 1980-11-07 | 1980-11-07 | Formation of thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15656080A JPS5782471A (en) | 1980-11-07 | 1980-11-07 | Formation of thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5782471A true JPS5782471A (en) | 1982-05-22 |
Family
ID=15630455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15656080A Pending JPS5782471A (en) | 1980-11-07 | 1980-11-07 | Formation of thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5782471A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102373435A (en) * | 2010-08-17 | 2012-03-14 | 鸿富锦精密工业（深圳）有限公司 | Film coating equipment |
-
1980
- 1980-11-07 JP JP15656080A patent/JPS5782471A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102373435A (en) * | 2010-08-17 | 2012-03-14 | 鸿富锦精密工业（深圳）有限公司 | Film coating equipment |
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