JPS55157232A - Method of inspecting pattern - Google Patents

Method of inspecting pattern

Info

Publication number
JPS55157232A
JPS55157232A JP6596079A JP6596079A JPS55157232A JP S55157232 A JPS55157232 A JP S55157232A JP 6596079 A JP6596079 A JP 6596079A JP 6596079 A JP6596079 A JP 6596079A JP S55157232 A JPS55157232 A JP S55157232A
Authority
JP
Japan
Prior art keywords
therebetween
video signal
photomask
comparison difference
displacement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6596079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6311771B2 (enrdf_load_stackoverflow
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6596079A priority Critical patent/JPS55157232A/ja
Publication of JPS55157232A publication Critical patent/JPS55157232A/ja
Publication of JPS6311771B2 publication Critical patent/JPS6311771B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6596079A 1979-05-28 1979-05-28 Method of inspecting pattern Granted JPS55157232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6596079A JPS55157232A (en) 1979-05-28 1979-05-28 Method of inspecting pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6596079A JPS55157232A (en) 1979-05-28 1979-05-28 Method of inspecting pattern

Publications (2)

Publication Number Publication Date
JPS55157232A true JPS55157232A (en) 1980-12-06
JPS6311771B2 JPS6311771B2 (enrdf_load_stackoverflow) 1988-03-16

Family

ID=13302055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6596079A Granted JPS55157232A (en) 1979-05-28 1979-05-28 Method of inspecting pattern

Country Status (1)

Country Link
JP (1) JPS55157232A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100728A (en) * 1980-12-16 1982-06-23 Matsushita Electric Ind Co Ltd Inspecting device for photomask
JPS57138135A (en) * 1981-02-20 1982-08-26 Hitachi Ltd Method and apparatus for inspecting pattern
JPS57159023A (en) * 1981-03-27 1982-10-01 Hitachi Ltd Inspecting device of pattern
JPS59173736A (ja) * 1983-03-11 1984-10-01 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 光学検査装置
JPS59201427A (ja) * 1983-04-28 1984-11-15 Toshiba Corp Ｉｃフレ−ム収納マガジン

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100728A (en) * 1980-12-16 1982-06-23 Matsushita Electric Ind Co Ltd Inspecting device for photomask
JPS57138135A (en) * 1981-02-20 1982-08-26 Hitachi Ltd Method and apparatus for inspecting pattern
JPS57159023A (en) * 1981-03-27 1982-10-01 Hitachi Ltd Inspecting device of pattern
JPS59173736A (ja) * 1983-03-11 1984-10-01 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 光学検査装置
JPS59201427A (ja) * 1983-04-28 1984-11-15 Toshiba Corp Ｉｃフレ−ム収納マガジン

Also Published As

Publication number Publication date
JPS6311771B2 (enrdf_load_stackoverflow) 1988-03-16

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