JPS55157230A - Pattern position detector - Google Patents

Pattern position detector

Info

Publication number
JPS55157230A
JPS55157230A JP6504779A JP6504779A JPS55157230A JP S55157230 A JPS55157230 A JP S55157230A JP 6504779 A JP6504779 A JP 6504779A JP 6504779 A JP6504779 A JP 6504779A JP S55157230 A JPS55157230 A JP S55157230A
Authority
JP
Japan
Prior art keywords
plate
slit
scanning
pattern
position detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6504779A
Other languages
English (en)
Japanese (ja)
Other versions
JPS625333B2 (enFirst
Inventor
Mitsuyoshi Koizumi
Nobuyuki Akiyama
Yoshimasa Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6504779A priority Critical patent/JPS55157230A/ja
Publication of JPS55157230A publication Critical patent/JPS55157230A/ja
Publication of JPS625333B2 publication Critical patent/JPS625333B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP6504779A 1979-05-28 1979-05-28 Pattern position detector Granted JPS55157230A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6504779A JPS55157230A (en) 1979-05-28 1979-05-28 Pattern position detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6504779A JPS55157230A (en) 1979-05-28 1979-05-28 Pattern position detector

Publications (2)

Publication Number Publication Date
JPS55157230A true JPS55157230A (en) 1980-12-06
JPS625333B2 JPS625333B2 (enFirst) 1987-02-04

Family

ID=13275649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6504779A Granted JPS55157230A (en) 1979-05-28 1979-05-28 Pattern position detector

Country Status (1)

Country Link
JP (1) JPS55157230A (enFirst)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS59172724A (ja) * 1983-03-22 1984-09-29 Canon Inc マーク検出装置
JPH05234845A (ja) * 1991-05-08 1993-09-10 Hitachi Ltd 縮小投影露光装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS59172724A (ja) * 1983-03-22 1984-09-29 Canon Inc マーク検出装置
JPH05234845A (ja) * 1991-05-08 1993-09-10 Hitachi Ltd 縮小投影露光装置

Also Published As

Publication number Publication date
JPS625333B2 (enFirst) 1987-02-04

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