JPS55156947A - Lithographic plate preparation - Google Patents
Lithographic plate preparationInfo
- Publication number
- JPS55156947A JPS55156947A JP6327079A JP6327079A JPS55156947A JP S55156947 A JPS55156947 A JP S55156947A JP 6327079 A JP6327079 A JP 6327079A JP 6327079 A JP6327079 A JP 6327079A JP S55156947 A JPS55156947 A JP S55156947A
- Authority
- JP
- Japan
- Prior art keywords
- water
- solvent
- photosensitive layer
- printing
- silicone rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 5
- 239000002904 solvent Substances 0.000 abstract 4
- 229920002379 silicone rubber Polymers 0.000 abstract 3
- 239000004945 silicone rubber Substances 0.000 abstract 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- 239000011877 solvent mixture Substances 0.000 abstract 2
- 150000002334 glycols Chemical class 0.000 abstract 1
- 238000007654 immersion Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6327079A JPS55156947A (en) | 1979-05-24 | 1979-05-24 | Lithographic plate preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6327079A JPS55156947A (en) | 1979-05-24 | 1979-05-24 | Lithographic plate preparation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55156947A true JPS55156947A (en) | 1980-12-06 |
JPS6333140B2 JPS6333140B2 (enrdf_load_stackoverflow) | 1988-07-04 |
Family
ID=13224430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6327079A Granted JPS55156947A (en) | 1979-05-24 | 1979-05-24 | Lithographic plate preparation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55156947A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59146054A (ja) * | 1983-02-09 | 1984-08-21 | Toray Ind Inc | 湿し水不要平版印刷版用現像液 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5170004A (en) * | 1974-12-13 | 1976-06-17 | Toray Industries | Heibaninsatsubanno seizoho |
JPS5353403A (en) * | 1976-10-22 | 1978-05-15 | Asahi Chemical Ind | Original form for press plate and method of producing waterrfree lithographic press plate adopting same |
JPS5462003A (en) * | 1977-10-25 | 1979-05-18 | Mitsumura Printing | Method of anastatic printing |
JPS5489805A (en) * | 1977-12-27 | 1979-07-17 | Toray Industries | Makeup method of planographic printing plate |
-
1979
- 1979-05-24 JP JP6327079A patent/JPS55156947A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5170004A (en) * | 1974-12-13 | 1976-06-17 | Toray Industries | Heibaninsatsubanno seizoho |
JPS5353403A (en) * | 1976-10-22 | 1978-05-15 | Asahi Chemical Ind | Original form for press plate and method of producing waterrfree lithographic press plate adopting same |
JPS5462003A (en) * | 1977-10-25 | 1979-05-18 | Mitsumura Printing | Method of anastatic printing |
JPS5489805A (en) * | 1977-12-27 | 1979-07-17 | Toray Industries | Makeup method of planographic printing plate |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59146054A (ja) * | 1983-02-09 | 1984-08-21 | Toray Ind Inc | 湿し水不要平版印刷版用現像液 |
Also Published As
Publication number | Publication date |
---|---|
JPS6333140B2 (enrdf_load_stackoverflow) | 1988-07-04 |
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