JPS55156368A - Manufacture of thin-film transistor - Google Patents
Manufacture of thin-film transistorInfo
- Publication number
- JPS55156368A JPS55156368A JP6435079A JP6435079A JPS55156368A JP S55156368 A JPS55156368 A JP S55156368A JP 6435079 A JP6435079 A JP 6435079A JP 6435079 A JP6435079 A JP 6435079A JP S55156368 A JPS55156368 A JP S55156368A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- solution
- mask
- compound
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 4
- 238000007865 diluting Methods 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- JGJLWPGRMCADHB-UHFFFAOYSA-N hypobromite Inorganic materials Br[O-] JGJLWPGRMCADHB-UHFFFAOYSA-N 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000008367 deionised water Substances 0.000 abstract 1
- 229910021641 deionized water Inorganic materials 0.000 abstract 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 239000003643 water by type Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
Abstract
PURPOSE:To obtain a highly fine pattern of Cd-Se compound thin film, by using a solution, obtainable by diluting bromine water with deionized waters, as an ethcing solution for the Cd-Se compound thin film. CONSTITUTION:On a source electrode 2 and a drain electrode 3 on an insulating substrate 1, the Cd-Se compound layer 4' and an aluminum oxide layer 5' are formed in order. On these layers, an etching mask 7 is formed by a photo-resist, the layer 5' is etched and the layer 4' is also etched. Etching of this layer 4' is conducted in such a manner as to soak the substrate 1 in a solution obtained by diluting bromine water with deionized water. This solution is to be prepared not to deteriorate adhesiveness of a mask 7 by a position type photoresist, not to solve the layers 2, 3 and 5' to be brought in contact with the layer 4' and not to cause residue onto the exposed layer 4'. By doing so, it is possible to obtain the Cd-Se compound semiconductor layer 4 having precise pattern dimensions on prescribed sections. And then, a gate electrode 6 is formed after removing the mask 7.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6435079A JPS55156368A (en) | 1979-05-23 | 1979-05-23 | Manufacture of thin-film transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6435079A JPS55156368A (en) | 1979-05-23 | 1979-05-23 | Manufacture of thin-film transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55156368A true JPS55156368A (en) | 1980-12-05 |
Family
ID=13255698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6435079A Pending JPS55156368A (en) | 1979-05-23 | 1979-05-23 | Manufacture of thin-film transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55156368A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6136972A (en) * | 1984-07-30 | 1986-02-21 | Matsushita Electric Ind Co Ltd | Thin-film transistor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5326586A (en) * | 1976-08-20 | 1978-03-11 | Westinghouse Electric Corp | Thin film transistor and method of producing same |
-
1979
- 1979-05-23 JP JP6435079A patent/JPS55156368A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5326586A (en) * | 1976-08-20 | 1978-03-11 | Westinghouse Electric Corp | Thin film transistor and method of producing same |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6136972A (en) * | 1984-07-30 | 1986-02-21 | Matsushita Electric Ind Co Ltd | Thin-film transistor |
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