JPS55156329A - Manufacture for integrated element - Google Patents

Manufacture for integrated element

Info

Publication number
JPS55156329A
JPS55156329A JP6425979A JP6425979A JPS55156329A JP S55156329 A JPS55156329 A JP S55156329A JP 6425979 A JP6425979 A JP 6425979A JP 6425979 A JP6425979 A JP 6425979A JP S55156329 A JPS55156329 A JP S55156329A
Authority
JP
Japan
Prior art keywords
opening
layer
film
patterns
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6425979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6210011B2 (enrdf_load_stackoverflow
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6425979A priority Critical patent/JPS55156329A/ja
Publication of JPS55156329A publication Critical patent/JPS55156329A/ja
Publication of JPS6210011B2 publication Critical patent/JPS6210011B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP6425979A 1979-05-24 1979-05-24 Manufacture for integrated element Granted JPS55156329A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6425979A JPS55156329A (en) 1979-05-24 1979-05-24 Manufacture for integrated element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6425979A JPS55156329A (en) 1979-05-24 1979-05-24 Manufacture for integrated element

Publications (2)

Publication Number Publication Date
JPS55156329A true JPS55156329A (en) 1980-12-05
JPS6210011B2 JPS6210011B2 (enrdf_load_stackoverflow) 1987-03-04

Family

ID=13253004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6425979A Granted JPS55156329A (en) 1979-05-24 1979-05-24 Manufacture for integrated element

Country Status (1)

Country Link
JP (1) JPS55156329A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010624A (ja) * 1983-06-29 1985-01-19 Mitsubishi Electric Corp パタ−ン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010624A (ja) * 1983-06-29 1985-01-19 Mitsubishi Electric Corp パタ−ン形成方法

Also Published As

Publication number Publication date
JPS6210011B2 (enrdf_load_stackoverflow) 1987-03-04

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