JPS55154571A - Vacuum vapor deposition apparatus - Google Patents
Vacuum vapor deposition apparatusInfo
- Publication number
- JPS55154571A JPS55154571A JP6206979A JP6206979A JPS55154571A JP S55154571 A JPS55154571 A JP S55154571A JP 6206979 A JP6206979 A JP 6206979A JP 6206979 A JP6206979 A JP 6206979A JP S55154571 A JPS55154571 A JP S55154571A
- Authority
- JP
- Japan
- Prior art keywords
- room
- door
- vapor deposition
- opening
- clean
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title abstract 3
- 239000000463 material Substances 0.000 abstract 3
- 238000012423 maintenance Methods 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000011109 contamination Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000002955 isolation Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Testing Of Devices, Machine Parts, Or Other Structures Thereof (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6206979A JPS55154571A (en) | 1979-05-19 | 1979-05-19 | Vacuum vapor deposition apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6206979A JPS55154571A (en) | 1979-05-19 | 1979-05-19 | Vacuum vapor deposition apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55154571A true JPS55154571A (en) | 1980-12-02 |
| JPS628510B2 JPS628510B2 (cg-RX-API-DMAC7.html) | 1987-02-23 |
Family
ID=13189428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6206979A Granted JPS55154571A (en) | 1979-05-19 | 1979-05-19 | Vacuum vapor deposition apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55154571A (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01161262U (cg-RX-API-DMAC7.html) * | 1989-03-23 | 1989-11-09 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5421564U (cg-RX-API-DMAC7.html) * | 1977-07-14 | 1979-02-13 |
-
1979
- 1979-05-19 JP JP6206979A patent/JPS55154571A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5421564U (cg-RX-API-DMAC7.html) * | 1977-07-14 | 1979-02-13 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01161262U (cg-RX-API-DMAC7.html) * | 1989-03-23 | 1989-11-09 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS628510B2 (cg-RX-API-DMAC7.html) | 1987-02-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3507337C2 (cg-RX-API-DMAC7.html) | ||
| JPS6444035A (en) | Production using single wafer carrier | |
| HU9603619D0 (en) | Feeding apparatus for desinfecting and/or purifying liqid | |
| DE168437T1 (de) | Vorrichtung zur behandlung von scheiben. | |
| JPS51151384A (en) | Process for cultivating organic tissue or cells automatically | |
| JPS55154571A (en) | Vacuum vapor deposition apparatus | |
| JPS57194531A (en) | Electron beam transfer device | |
| ATE29846T1 (de) | Reinigungsvorrichtung fuer zahninstrumente, insbesondere turbinenbohrer und dergleichen. | |
| DE3278928D1 (en) | Method for preparation of a liquid to be lyophilized and use of said liquid | |
| JPS5763678A (en) | Sputtering device | |
| JPS6423538A (en) | Method and equipment for manufacturing semiconductor device | |
| GB1077246A (en) | Method and apparatus for sterilizing | |
| JPH042147A (ja) | 半導体基板の保管装置 | |
| JPS6411684A (en) | Method and device for cleaning sample carrying-in chamber | |
| JPS6442134A (en) | Apparatus for cleaning semiconductor wafer | |
| JPS5618427A (en) | Washing method for semiconductor substrate with pure water | |
| Austin | Effects of airspeed and humidity changes on spore discharge in Sordaria fimicola | |
| JPS57107235A (en) | Vacuum vapor growth device | |
| JPS54109895A (en) | Ion source | |
| JPS57152653A (en) | Wafer processing equipment for ion implanting device | |
| JPS57145319A (en) | Manufacturing device for semiconductor device | |
| JPS6425974A (en) | Sputtering device | |
| JP3005802B2 (ja) | イオンビーム装置及びそのガス導入装置 | |
| GB945554A (en) | Method of and apparatus for the drying of materials | |
| JPS621225Y2 (cg-RX-API-DMAC7.html) |