JPS55148433A - Manufacture of semiconductor device and device therefor - Google Patents
Manufacture of semiconductor device and device thereforInfo
- Publication number
- JPS55148433A JPS55148433A JP5615279A JP5615279A JPS55148433A JP S55148433 A JPS55148433 A JP S55148433A JP 5615279 A JP5615279 A JP 5615279A JP 5615279 A JP5615279 A JP 5615279A JP S55148433 A JPS55148433 A JP S55148433A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- supporting rods
- rotating
- heat treatment
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P95/90—
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5615279A JPS55148433A (en) | 1979-05-08 | 1979-05-08 | Manufacture of semiconductor device and device therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5615279A JPS55148433A (en) | 1979-05-08 | 1979-05-08 | Manufacture of semiconductor device and device therefor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55148433A true JPS55148433A (en) | 1980-11-19 |
| JPS626646B2 JPS626646B2 (OSRAM) | 1987-02-12 |
Family
ID=13019109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5615279A Granted JPS55148433A (en) | 1979-05-08 | 1979-05-08 | Manufacture of semiconductor device and device therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55148433A (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57138130A (en) * | 1981-02-20 | 1982-08-26 | Fujitsu Ltd | Diffusion treatment method |
| US5180150A (en) * | 1992-01-24 | 1993-01-19 | Hughes Danbury Optical Systems, Inc. | Apparatus for providing consistent registration of semiconductor wafers |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4834670A (OSRAM) * | 1971-09-07 | 1973-05-21 | ||
| JPS5277674A (en) * | 1975-12-22 | 1977-06-30 | Siemens Ag | Method of heat treatment for semiconductor board |
-
1979
- 1979-05-08 JP JP5615279A patent/JPS55148433A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4834670A (OSRAM) * | 1971-09-07 | 1973-05-21 | ||
| JPS5277674A (en) * | 1975-12-22 | 1977-06-30 | Siemens Ag | Method of heat treatment for semiconductor board |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57138130A (en) * | 1981-02-20 | 1982-08-26 | Fujitsu Ltd | Diffusion treatment method |
| US5180150A (en) * | 1992-01-24 | 1993-01-19 | Hughes Danbury Optical Systems, Inc. | Apparatus for providing consistent registration of semiconductor wafers |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS626646B2 (OSRAM) | 1987-02-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3699298A (en) | Methods and apparatus for heating and/or coating articles | |
| GB952931A (en) | Improved polyisocyanate compositions | |
| US3806360A (en) | Methods for heating and/or coating articles | |
| JPS55148433A (en) | Manufacture of semiconductor device and device therefor | |
| JPS5588323A (en) | Manufacture of semiconductor device | |
| JPS5265662A (en) | Method and device for diffusion to semiconductor substrate by high fre quency induction heating | |
| SE7408070L (OSRAM) | ||
| JPS63147894A (ja) | 気相成長方法と縦型気相成長装置 | |
| JPS5693873A (en) | Ion nitridation apparatus | |
| JPH06117762A (ja) | 回転式熱処理炉 | |
| JPS5467377A (en) | Plasma processing apparatus | |
| SU654694A1 (ru) | Устройство дл нанесени покрытий из газовой фазы | |
| JP3173201B2 (ja) | 被処理物保持装置 | |
| JPS5497375A (en) | Cylindrical plasma processor | |
| JPS60136307A (ja) | 半導体装置の製造装置 | |
| JPS5513983A (en) | Heat treatment method of semiconductor base plate | |
| JPS5980927A (ja) | エピタキシヤル成長装置 | |
| US1720978A (en) | Means applicable for use in the steaming of hats | |
| JPS61116822A (ja) | プラズマ処理装置 | |
| JPH05343328A (ja) | Cvd装置 | |
| JPS63293923A (ja) | 処理装置 | |
| SU575126A1 (ru) | Устройство дл получени слоев | |
| JPH0425299B2 (OSRAM) | ||
| JPS55151330A (en) | Wafer holder | |
| JPS5740920A (en) | Supporter for semiconductor wafer |