JPS55140278A - Method of fabricating solar cell - Google Patents

Method of fabricating solar cell

Info

Publication number
JPS55140278A
JPS55140278A JP4879179A JP4879179A JPS55140278A JP S55140278 A JPS55140278 A JP S55140278A JP 4879179 A JP4879179 A JP 4879179A JP 4879179 A JP4879179 A JP 4879179A JP S55140278 A JPS55140278 A JP S55140278A
Authority
JP
Japan
Prior art keywords
substrate
thin film
electrode
solar cell
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4879179A
Other languages
Japanese (ja)
Inventor
Seiji Ikegami
Hitoshi Matsumoto
Nobuo Nakayama
Akihiko Nakano
Kazufumi Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP4879179A priority Critical patent/JPS55140278A/en
Publication of JPS55140278A publication Critical patent/JPS55140278A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0368Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
    • H01L31/03682Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic Table
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/546Polycrystalline silicon PV cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To provide inexpensively a Schottky type thin film solar cell by coating and calcining paste containing trace of aluminum powder defined in adding amount, silicon powder and organic binder on an aluminum substrate, heating the substrate to produce polycrystalline silicon thin film thereon, and forming a transparent electrode on the surface thereof. CONSTITUTION:Small amount of aluminum powder such as 0.0001-1 atom-% is added to n-type silicon powder, suitable amount of organic binder such as propylene glycol is added thereto, the mixture is kneaded to form paste state. This paste is coated thinly on an aluminum substrate 1, and the substrate 1 is heated at 530- 600 deg.C for 30min in N2 gas atmosphere to form a polycrystalline silicon thin film 2. Then, the substrate is then heated at approx. 400 deg.C for 10min in the air, a transparent SnO2 electrode is coated by spray process on the entire surface, and with the electrode 3 and the substrare 1 used as electrodes light 4 is incident to the electrode 3 side. Thus, a silicon thin film solar cell having 5% of conversion efficiency can be continuously produced.
JP4879179A 1979-04-19 1979-04-19 Method of fabricating solar cell Pending JPS55140278A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4879179A JPS55140278A (en) 1979-04-19 1979-04-19 Method of fabricating solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4879179A JPS55140278A (en) 1979-04-19 1979-04-19 Method of fabricating solar cell

Publications (1)

Publication Number Publication Date
JPS55140278A true JPS55140278A (en) 1980-11-01

Family

ID=12813052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4879179A Pending JPS55140278A (en) 1979-04-19 1979-04-19 Method of fabricating solar cell

Country Status (1)

Country Link
JP (1) JPS55140278A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390743A (en) * 1980-09-20 1983-06-28 Licentia Patent Verwaltungs-Gmbh Silicon layer solar cell and method of producing it
EP0112480A2 (en) * 1982-11-19 1984-07-04 Siemens Aktiengesellschaft Amorphous silicium solar cell

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390743A (en) * 1980-09-20 1983-06-28 Licentia Patent Verwaltungs-Gmbh Silicon layer solar cell and method of producing it
EP0112480A2 (en) * 1982-11-19 1984-07-04 Siemens Aktiengesellschaft Amorphous silicium solar cell

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