JPS55133561A - Method of fabricating lead frame for semiconductor - Google Patents
Method of fabricating lead frame for semiconductorInfo
- Publication number
- JPS55133561A JPS55133561A JP4016679A JP4016679A JPS55133561A JP S55133561 A JPS55133561 A JP S55133561A JP 4016679 A JP4016679 A JP 4016679A JP 4016679 A JP4016679 A JP 4016679A JP S55133561 A JPS55133561 A JP S55133561A
- Authority
- JP
- Japan
- Prior art keywords
- lead frame
- metal
- resist
- positive image
- bonded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002184 metal Substances 0.000 abstract 8
- 229910052751 metal Inorganic materials 0.000 abstract 8
- 238000007747 plating Methods 0.000 abstract 3
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 238000005238 degreasing Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49579—Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
- H01L23/49582—Metallic layers on lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4821—Flat leads, e.g. lead frames with or without insulating supports
- H01L21/4828—Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
PURPOSE:To shorten the steps of fabricating the lead frame for a semiconductor by forming a resist having a positive image excluding the bonded portion on the front surface of a metal plate and a resist having a positive image on the back surface of the plate, semi-etching the metal plate at the bonded portion and then plating metal thereon. CONSTITUTION:The first resist 2 having a positive image excluding a portion to be bonded by a metal plating to a lead frame is formed on the front surface of a metal plate 1 made of Cu, Ni, Cr or the like, and a second resist 3 having a positive image of the lead frame is formed on the back surface of the metal plate 1. The exposed portion is etched and removed, the metal plated portion to be bonded is semi-etched, rinsed with water, and then plated with bonding metal 5 such as Au, Ag or the like. The first and second resists 2, 3 are then separated to complete the lead frame. Thus, it eliminates the steps of mounting a plating jig and degreasing it to shorten the steps and also enhances the matching step of the portions to be plated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4016679A JPS6024583B2 (en) | 1979-04-03 | 1979-04-03 | Manufacturing method for semiconductor lead frames |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4016679A JPS6024583B2 (en) | 1979-04-03 | 1979-04-03 | Manufacturing method for semiconductor lead frames |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55133561A true JPS55133561A (en) | 1980-10-17 |
JPS6024583B2 JPS6024583B2 (en) | 1985-06-13 |
Family
ID=12573171
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4016679A Expired JPS6024583B2 (en) | 1979-04-03 | 1979-04-03 | Manufacturing method for semiconductor lead frames |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6024583B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61279698A (en) * | 1985-06-05 | 1986-12-10 | Hitachi Cable Ltd | Production of lead frame having microspot plating part |
JPH01261852A (en) * | 1988-04-12 | 1989-10-18 | Fuji Plant Kogyo Kk | Method of partially plating lead frame |
KR100530754B1 (en) * | 1998-09-09 | 2006-02-28 | 삼성테크윈 주식회사 | Method of continuously manufacturing a lead frame |
JP2010010634A (en) * | 2008-06-30 | 2010-01-14 | Shinko Electric Ind Co Ltd | Lead frame, and method of manufacturing semiconductor device |
-
1979
- 1979-04-03 JP JP4016679A patent/JPS6024583B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61279698A (en) * | 1985-06-05 | 1986-12-10 | Hitachi Cable Ltd | Production of lead frame having microspot plating part |
JPH01261852A (en) * | 1988-04-12 | 1989-10-18 | Fuji Plant Kogyo Kk | Method of partially plating lead frame |
KR100530754B1 (en) * | 1998-09-09 | 2006-02-28 | 삼성테크윈 주식회사 | Method of continuously manufacturing a lead frame |
JP2010010634A (en) * | 2008-06-30 | 2010-01-14 | Shinko Electric Ind Co Ltd | Lead frame, and method of manufacturing semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS6024583B2 (en) | 1985-06-13 |
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