JPS5510985B2 - - Google Patents

Info

Publication number
JPS5510985B2
JPS5510985B2 JP7127476A JP7127476A JPS5510985B2 JP S5510985 B2 JPS5510985 B2 JP S5510985B2 JP 7127476 A JP7127476 A JP 7127476A JP 7127476 A JP7127476 A JP 7127476A JP S5510985 B2 JPS5510985 B2 JP S5510985B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7127476A
Other languages
Japanese (ja)
Other versions
JPS526087A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS526087A publication Critical patent/JPS526087A/ja
Publication of JPS5510985B2 publication Critical patent/JPS5510985B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P30/21
    • H10P14/6312
    • H10P30/206
    • H10P30/226
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • H10P14/6324
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/084Ion implantation of compound devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/92Electrolytic coating of circuit board or printed circuit, other than selected area coating

Landscapes

  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
JP51071274A 1975-06-30 1976-06-18 Insb semiconductor device Granted JPS526087A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/591,996 US4080721A (en) 1975-06-30 1975-06-30 Fabrication of semiconductor device

Publications (2)

Publication Number Publication Date
JPS526087A JPS526087A (en) 1977-01-18
JPS5510985B2 true JPS5510985B2 (cg-RX-API-DMAC10.html) 1980-03-21

Family

ID=24368832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51071274A Granted JPS526087A (en) 1975-06-30 1976-06-18 Insb semiconductor device

Country Status (6)

Country Link
US (1) US4080721A (cg-RX-API-DMAC10.html)
JP (1) JPS526087A (cg-RX-API-DMAC10.html)
CA (1) CA1061015A (cg-RX-API-DMAC10.html)
DE (1) DE2628406A1 (cg-RX-API-DMAC10.html)
FR (1) FR2316727A1 (cg-RX-API-DMAC10.html)
GB (1) GB1488329A (cg-RX-API-DMAC10.html)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4177298A (en) * 1977-03-22 1979-12-04 Hitachi, Ltd. Method for producing an InSb thin film element
DE2755418A1 (de) * 1977-12-13 1979-06-21 Bosch Gmbh Robert Verfahren zur herstellung eines halbleiter-bauelements
US4247373A (en) * 1978-06-20 1981-01-27 Matsushita Electric Industrial Co., Ltd. Method of making semiconductor device
US4348473A (en) * 1981-03-04 1982-09-07 Xerox Corporation Dry process for the production of microelectronic devices
JPS58108774A (ja) * 1981-12-22 1983-06-28 Citizen Watch Co Ltd 薄膜トランジスタの製造方法
US4519127A (en) * 1983-02-28 1985-05-28 Tokyo Shibaura Denki Kabushiki Kaisha Method of manufacturing a MESFET by controlling implanted peak surface dopants
FR2556135B1 (fr) * 1983-12-02 1986-09-19 Thomson Csf Photo-diode a l'antimoniure d'indium et procede de fabrication
US4898834A (en) * 1988-06-27 1990-02-06 Amber Engineering, Inc. Open-tube, benign-environment annealing method for compound semiconductors
US5143857A (en) * 1988-11-07 1992-09-01 Triquint Semiconductor, Inc. Method of fabricating an electronic device with reduced susceptiblity to backgating effects
GB2331841A (en) * 1997-11-28 1999-06-02 Secr Defence Field effect transistor
US6194295B1 (en) * 1999-05-17 2001-02-27 National Science Council Of Republic Of China Production of a refractory metal by chemical vapor deposition of a bilayer-stacked tungsten metal
US7687256B2 (en) * 2002-04-11 2010-03-30 Spire Corporation Surface activated biochip

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3099776A (en) * 1960-06-10 1963-07-30 Texas Instruments Inc Indium antimonide transistor
US3515956A (en) * 1967-10-16 1970-06-02 Ion Physics Corp High-voltage semiconductor device having a guard ring containing substitutionally active ions in interstitial positions
DE2041035C2 (de) * 1970-08-18 1982-10-28 Siemens AG, 1000 Berlin und 8000 München Verfahren zum gleichzeitigen elektrolytischen in bezug auf die Sperrfähigkeit selektiven Behandeln von mehreren in einer gemeinsamen Halbleiterscheibe erzeugten gleichen Halbleiterbauelementen
US3929589A (en) * 1974-02-08 1975-12-30 Bell Telephone Labor Inc Selective area oxidation of III-V compound semiconductors

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
ION IMPLANTATION=1971 *
JOURNAL OF APPLIED PHYSICS=1970 *

Also Published As

Publication number Publication date
CA1061015A (en) 1979-08-21
DE2628406A1 (de) 1977-02-03
FR2316727B1 (cg-RX-API-DMAC10.html) 1978-08-25
FR2316727A1 (fr) 1977-01-28
GB1488329A (en) 1977-10-12
US4080721A (en) 1978-03-28
JPS526087A (en) 1977-01-18

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