JPS526087A - Insb semiconductor device - Google Patents
Insb semiconductor deviceInfo
- Publication number
- JPS526087A JPS526087A JP51071274A JP7127476A JPS526087A JP S526087 A JPS526087 A JP S526087A JP 51071274 A JP51071274 A JP 51071274A JP 7127476 A JP7127476 A JP 7127476A JP S526087 A JPS526087 A JP S526087A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- insb semiconductor
- insb
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2654—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds
- H01L21/26546—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds of electrically active species
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02241—III-V semiconductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02258—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by anodic treatment, e.g. anodic oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26593—Bombardment with radiation with high-energy radiation producing ion implantation at a temperature lower than room temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/3165—Inorganic layers composed of oxides or glassy oxides or oxide based glass formed by oxidation
- H01L21/31654—Inorganic layers composed of oxides or glassy oxides or oxide based glass formed by oxidation of semiconductor materials, e.g. the body itself
- H01L21/3167—Inorganic layers composed of oxides or glassy oxides or oxide based glass formed by oxidation of semiconductor materials, e.g. the body itself of anodic oxidation
- H01L21/31679—Inorganic layers composed of oxides or glassy oxides or oxide based glass formed by oxidation of semiconductor materials, e.g. the body itself of anodic oxidation of AIII BV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/084—Ion implantation of compound devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
- Y10S205/92—Electrolytic coating of circuit board or printed circuit, other than selected area coating
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Ceramic Engineering (AREA)
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/591,996 US4080721A (en) | 1975-06-30 | 1975-06-30 | Fabrication of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS526087A true JPS526087A (en) | 1977-01-18 |
JPS5510985B2 JPS5510985B2 (ja) | 1980-03-21 |
Family
ID=24368832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51071274A Granted JPS526087A (en) | 1975-06-30 | 1976-06-18 | Insb semiconductor device |
Country Status (6)
Country | Link |
---|---|
US (1) | US4080721A (ja) |
JP (1) | JPS526087A (ja) |
CA (1) | CA1061015A (ja) |
DE (1) | DE2628406A1 (ja) |
FR (1) | FR2316727A1 (ja) |
GB (1) | GB1488329A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58108774A (ja) * | 1981-12-22 | 1983-06-28 | Citizen Watch Co Ltd | 薄膜トランジスタの製造方法 |
JP2009194392A (ja) * | 1997-11-28 | 2009-08-27 | Qinetiq Ltd | 電界効果トランジスタ |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4177298A (en) * | 1977-03-22 | 1979-12-04 | Hitachi, Ltd. | Method for producing an InSb thin film element |
DE2755418A1 (de) * | 1977-12-13 | 1979-06-21 | Bosch Gmbh Robert | Verfahren zur herstellung eines halbleiter-bauelements |
US4247373A (en) * | 1978-06-20 | 1981-01-27 | Matsushita Electric Industrial Co., Ltd. | Method of making semiconductor device |
US4348473A (en) * | 1981-03-04 | 1982-09-07 | Xerox Corporation | Dry process for the production of microelectronic devices |
US4519127A (en) * | 1983-02-28 | 1985-05-28 | Tokyo Shibaura Denki Kabushiki Kaisha | Method of manufacturing a MESFET by controlling implanted peak surface dopants |
FR2556135B1 (fr) * | 1983-12-02 | 1986-09-19 | Thomson Csf | Photo-diode a l'antimoniure d'indium et procede de fabrication |
US4898834A (en) * | 1988-06-27 | 1990-02-06 | Amber Engineering, Inc. | Open-tube, benign-environment annealing method for compound semiconductors |
US5143857A (en) * | 1988-11-07 | 1992-09-01 | Triquint Semiconductor, Inc. | Method of fabricating an electronic device with reduced susceptiblity to backgating effects |
US6194295B1 (en) * | 1999-05-17 | 2001-02-27 | National Science Council Of Republic Of China | Production of a refractory metal by chemical vapor deposition of a bilayer-stacked tungsten metal |
US7687256B2 (en) * | 2002-04-11 | 2010-03-30 | Spire Corporation | Surface activated biochip |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3099776A (en) * | 1960-06-10 | 1963-07-30 | Texas Instruments Inc | Indium antimonide transistor |
US3515956A (en) * | 1967-10-16 | 1970-06-02 | Ion Physics Corp | High-voltage semiconductor device having a guard ring containing substitutionally active ions in interstitial positions |
DE2041035C2 (de) * | 1970-08-18 | 1982-10-28 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum gleichzeitigen elektrolytischen in bezug auf die Sperrfähigkeit selektiven Behandeln von mehreren in einer gemeinsamen Halbleiterscheibe erzeugten gleichen Halbleiterbauelementen |
US3929589A (en) * | 1974-02-08 | 1975-12-30 | Bell Telephone Labor Inc | Selective area oxidation of III-V compound semiconductors |
-
1975
- 1975-06-30 US US05/591,996 patent/US4080721A/en not_active Expired - Lifetime
-
1976
- 1976-05-21 FR FR7616136A patent/FR2316727A1/fr active Granted
- 1976-05-24 GB GB21374/76A patent/GB1488329A/en not_active Expired
- 1976-06-04 CA CA254,110A patent/CA1061015A/en not_active Expired
- 1976-06-18 JP JP51071274A patent/JPS526087A/ja active Granted
- 1976-06-24 DE DE19762628406 patent/DE2628406A1/de not_active Withdrawn
Non-Patent Citations (2)
Title |
---|
ION IMPLANTATION=1971 * |
JOURNAL OF APPLIED PHYSICS=1970 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58108774A (ja) * | 1981-12-22 | 1983-06-28 | Citizen Watch Co Ltd | 薄膜トランジスタの製造方法 |
JPH0354476B2 (ja) * | 1981-12-22 | 1991-08-20 | ||
JP2009194392A (ja) * | 1997-11-28 | 2009-08-27 | Qinetiq Ltd | 電界効果トランジスタ |
JP2011049599A (ja) * | 1997-11-28 | 2011-03-10 | Qinetiq Ltd | 電界効果トランジスタ |
Also Published As
Publication number | Publication date |
---|---|
CA1061015A (en) | 1979-08-21 |
DE2628406A1 (de) | 1977-02-03 |
FR2316727A1 (fr) | 1977-01-28 |
GB1488329A (en) | 1977-10-12 |
JPS5510985B2 (ja) | 1980-03-21 |
US4080721A (en) | 1978-03-28 |
FR2316727B1 (ja) | 1978-08-25 |
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