JPS55107775A - Sputtering target - Google Patents

Sputtering target

Info

Publication number
JPS55107775A
JPS55107775A JP1349979A JP1349979A JPS55107775A JP S55107775 A JPS55107775 A JP S55107775A JP 1349979 A JP1349979 A JP 1349979A JP 1349979 A JP1349979 A JP 1349979A JP S55107775 A JPS55107775 A JP S55107775A
Authority
JP
Japan
Prior art keywords
target
metallizing
breaks
fixed
sputtering apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1349979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6346145B2 (enrdf_load_stackoverflow
Inventor
Koji Nishiyama
Suehiro Kato
Takeshi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP1349979A priority Critical patent/JPS55107775A/ja
Publication of JPS55107775A publication Critical patent/JPS55107775A/ja
Publication of JPS6346145B2 publication Critical patent/JPS6346145B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP1349979A 1979-02-07 1979-02-07 Sputtering target Granted JPS55107775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1349979A JPS55107775A (en) 1979-02-07 1979-02-07 Sputtering target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1349979A JPS55107775A (en) 1979-02-07 1979-02-07 Sputtering target

Publications (2)

Publication Number Publication Date
JPS55107775A true JPS55107775A (en) 1980-08-19
JPS6346145B2 JPS6346145B2 (enrdf_load_stackoverflow) 1988-09-13

Family

ID=11834802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1349979A Granted JPS55107775A (en) 1979-02-07 1979-02-07 Sputtering target

Country Status (1)

Country Link
JP (1) JPS55107775A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02109641U (enrdf_load_stackoverflow) * 1989-02-16 1990-09-03
JPH02143943U (enrdf_load_stackoverflow) * 1989-05-09 1990-12-06

Also Published As

Publication number Publication date
JPS6346145B2 (enrdf_load_stackoverflow) 1988-09-13

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