JPS5489476A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5489476A JPS5489476A JP15832277A JP15832277A JPS5489476A JP S5489476 A JPS5489476 A JP S5489476A JP 15832277 A JP15832277 A JP 15832277A JP 15832277 A JP15832277 A JP 15832277A JP S5489476 A JPS5489476 A JP S5489476A
- Authority
- JP
- Japan
- Prior art keywords
- film
- wafer
- implanted
- time
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE: To obviate the occurrence of insulation breakdown in film despite high dose quantity by beforehand exposing the wafer by forming grooves in the film of the regions to be implanted at the time of implanting ions to the semicoductor wafer deposited with the insulation film.
CONSTITUTION: At the time of implanting ions into a semiconductor wafer 1 provided with insulation film 2 on the surface, grooves 2A are provided in the film 2 to dice the film 2 and expose the surface of the wafer to be implanted. At this time, provision of the films 2A in the position of the scribe lines to be provided later for the purpose of dicing the wafer to chips is convenient. If ions are implanted after these, the production of the insulation film in the stagnation of ion charges does not occur despite high dose quantity.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15832277A JPS5489476A (en) | 1977-12-27 | 1977-12-27 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15832277A JPS5489476A (en) | 1977-12-27 | 1977-12-27 | Production of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5489476A true JPS5489476A (en) | 1979-07-16 |
JPS617727B2 JPS617727B2 (en) | 1986-03-08 |
Family
ID=15669096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15832277A Granted JPS5489476A (en) | 1977-12-27 | 1977-12-27 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5489476A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63278325A (en) * | 1987-05-11 | 1988-11-16 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1977
- 1977-12-27 JP JP15832277A patent/JPS5489476A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63278325A (en) * | 1987-05-11 | 1988-11-16 | Fujitsu Ltd | Manufacture of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS617727B2 (en) | 1986-03-08 |
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