JPS5478984A - Evaluation method of film quality for insulation film - Google Patents
Evaluation method of film quality for insulation filmInfo
- Publication number
- JPS5478984A JPS5478984A JP14670477A JP14670477A JPS5478984A JP S5478984 A JPS5478984 A JP S5478984A JP 14670477 A JP14670477 A JP 14670477A JP 14670477 A JP14670477 A JP 14670477A JP S5478984 A JPS5478984 A JP S5478984A
- Authority
- JP
- Japan
- Prior art keywords
- film
- defects
- liquid crystal
- electrode
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To evaluate the film quality by changing the strength of electric field applied to the insulation film, through the application of dynamic scattering phenomenon of nematic liquid crystal.
CONSTITUTION: The test piece 100 has the SiO2 film 2 including defects 3 on the substrate 1. The Al electrode 4 is formed on the film 2, nematic liquid crystal film 5 is coated, and the transparent conductive film 6 coated on the glass plate 7 is laminated. The insulation spacer 8 is inserted between the Al elctrode around the test piece and the conductive film 6. Next, variable DC voltage 9 is applied between the Si substrate 1 and the transparent conductive film 6. If the DC voltage has the value more than the threshold value causing dynamic scatter phenomenon to the liquid crystal 5 and the defects 3 are pin holes causing leakage between the electrode 4 and the substrate 1, the liquid crystal film on the Al electrode having defects 3 causes dynamic scattering phenomenon. Further, the defects due to defective break down voltage causes leakage as well as scattering phenomenon. Thus, no probe is required and the number of defects and position are easily detected, and by changing the applied voltage, the nature of defects can be known from the change in the reflection rate of the conductive electrode group from manu aspects.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14670477A JPS594854B2 (en) | 1977-12-06 | 1977-12-06 | Insulating film quality evaluation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14670477A JPS594854B2 (en) | 1977-12-06 | 1977-12-06 | Insulating film quality evaluation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5478984A true JPS5478984A (en) | 1979-06-23 |
JPS594854B2 JPS594854B2 (en) | 1984-02-01 |
Family
ID=15413650
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14670477A Expired JPS594854B2 (en) | 1977-12-06 | 1977-12-06 | Insulating film quality evaluation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS594854B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0532685Y2 (en) * | 1986-03-26 | 1993-08-20 |
-
1977
- 1977-12-06 JP JP14670477A patent/JPS594854B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS594854B2 (en) | 1984-02-01 |
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