JPS5457868A - Wafer scanner - Google Patents

Wafer scanner

Info

Publication number
JPS5457868A
JPS5457868A JP12347277A JP12347277A JPS5457868A JP S5457868 A JPS5457868 A JP S5457868A JP 12347277 A JP12347277 A JP 12347277A JP 12347277 A JP12347277 A JP 12347277A JP S5457868 A JPS5457868 A JP S5457868A
Authority
JP
Japan
Prior art keywords
wafer
rotating cylinder
ion beam
angle
fixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12347277A
Other languages
Japanese (ja)
Inventor
Hidemi Koike
Kuniyuki Sakumichi
Katsumi Tokikuchi
Keizo Suzuki
Ichiro Shikamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12347277A priority Critical patent/JPS5457868A/en
Publication of JPS5457868A publication Critical patent/JPS5457868A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To make the implantation amount uniform regardless of the size of a rotating cylinder by enabling a wafer to turn on the axis of a rotating cylinder tracing its external circumference and by changing an angle contained by the wafer and an ion beam sequentially.
CONSTITUTION: Wafer 5 is fixed onto the external circumference of rotating cylinder 7 by rotatable wafer holder 6. Further, wafer holder 6 is fixed to arm 8, which is made in contact invariably with the inside surface of cam 9 fixed inside the vacuum tank of the implantation chamber. In accordance with the rotation of rotating cylinder 7, only range (γ) which ion beam 10 strikes wafer 5 is varied by α= β/31/2 (α is an angle of wafer 5 against the direction perpendicular to ion beam 10, and β is a rotation angle of the rotating cylinder) and the direction of wafer 5 is finely changed to the axial direction of the rotating cylinder
COPYRIGHT: (C)1979,JPO&Japio
JP12347277A 1977-10-17 1977-10-17 Wafer scanner Pending JPS5457868A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12347277A JPS5457868A (en) 1977-10-17 1977-10-17 Wafer scanner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12347277A JPS5457868A (en) 1977-10-17 1977-10-17 Wafer scanner

Publications (1)

Publication Number Publication Date
JPS5457868A true JPS5457868A (en) 1979-05-10

Family

ID=14861463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12347277A Pending JPS5457868A (en) 1977-10-17 1977-10-17 Wafer scanner

Country Status (1)

Country Link
JP (1) JPS5457868A (en)

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