JPS54158870A - Etching method - Google Patents

Etching method

Info

Publication number
JPS54158870A
JPS54158870A JP6848578A JP6848578A JPS54158870A JP S54158870 A JPS54158870 A JP S54158870A JP 6848578 A JP6848578 A JP 6848578A JP 6848578 A JP6848578 A JP 6848578A JP S54158870 A JPS54158870 A JP S54158870A
Authority
JP
Japan
Prior art keywords
etching
substrate
film
depth
rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6848578A
Other languages
English (en)
Inventor
Hiroshi Miyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6848578A priority Critical patent/JPS54158870A/ja
Publication of JPS54158870A publication Critical patent/JPS54158870A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP6848578A 1978-06-06 1978-06-06 Etching method Pending JPS54158870A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6848578A JPS54158870A (en) 1978-06-06 1978-06-06 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6848578A JPS54158870A (en) 1978-06-06 1978-06-06 Etching method

Publications (1)

Publication Number Publication Date
JPS54158870A true JPS54158870A (en) 1979-12-15

Family

ID=13375023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6848578A Pending JPS54158870A (en) 1978-06-06 1978-06-06 Etching method

Country Status (1)

Country Link
JP (1) JPS54158870A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56105637A (en) * 1980-01-28 1981-08-22 Nec Corp Formation of pattern
JPS5817689A (ja) * 1981-07-24 1983-02-01 Fujitsu Ltd ジヨセフソン回路の製造方法
JP2014157853A (ja) * 2013-02-14 2014-08-28 Toppan Printing Co Ltd パターン形成体の製造方法およびパターン形成体

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845443A (ja) * 1971-10-14 1973-06-29

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845443A (ja) * 1971-10-14 1973-06-29

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56105637A (en) * 1980-01-28 1981-08-22 Nec Corp Formation of pattern
JPS5817689A (ja) * 1981-07-24 1983-02-01 Fujitsu Ltd ジヨセフソン回路の製造方法
JPH0334675B2 (ja) * 1981-07-24 1991-05-23 Fujitsu Ltd
JP2014157853A (ja) * 2013-02-14 2014-08-28 Toppan Printing Co Ltd パターン形成体の製造方法およびパターン形成体

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