JPS54139789A - Ion source apparatus - Google Patents

Ion source apparatus

Info

Publication number
JPS54139789A
JPS54139789A JP4662478A JP4662478A JPS54139789A JP S54139789 A JPS54139789 A JP S54139789A JP 4662478 A JP4662478 A JP 4662478A JP 4662478 A JP4662478 A JP 4662478A JP S54139789 A JPS54139789 A JP S54139789A
Authority
JP
Japan
Prior art keywords
orifice
hole
ion beam
bypass
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4662478A
Other languages
Japanese (ja)
Other versions
JPS5845781B2 (en
Inventor
Mitsuo Fujiwara
Takeshi Koike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP53046624A priority Critical patent/JPS5845781B2/en
Publication of JPS54139789A publication Critical patent/JPS54139789A/en
Publication of JPS5845781B2 publication Critical patent/JPS5845781B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE: To make possible radiation of ion beams in a stable state by providing a bypass hole for ion beam in anode or orifice so that even if the hole diameter of the orifice of the ion source changes the ion source is held always at an optimum vacuum degree.
CONSTITUTION: An anode 3 is disposed in the light end portion of an intermediate electrode and is provided with an orifice 4 for emission of ion beam, where an ion beam exit hole 5 is formed. Leading-out of a fine ion beam entails exchanging of the exit hole 5 to an orifice of a smaller diameter and this results in decreased exhaust conductance. In order to correct this decrease in the exhaust conductance, it is exchanged with an anode 3 formed with a bypass hole 12 which becomes a bypass of the exit hole 5 or the one formed with the bypass hole in the orifice 4 itself. This bypass hole 12 enables the adequate exhaust conductance of vacuum exhaust to be maintained even if the diameter of the orifice 4 becomes smaller, thus enabling a desired vacuum degree to be maintained and the stable ion beam to be drawn out.
COPYRIGHT: (C)1979,JPO&Japio
JP53046624A 1978-04-21 1978-04-21 ion source device Expired JPS5845781B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53046624A JPS5845781B2 (en) 1978-04-21 1978-04-21 ion source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53046624A JPS5845781B2 (en) 1978-04-21 1978-04-21 ion source device

Publications (2)

Publication Number Publication Date
JPS54139789A true JPS54139789A (en) 1979-10-30
JPS5845781B2 JPS5845781B2 (en) 1983-10-12

Family

ID=12752436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53046624A Expired JPS5845781B2 (en) 1978-04-21 1978-04-21 ion source device

Country Status (1)

Country Link
JP (1) JPS5845781B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177848A (en) * 1983-03-28 1984-10-08 Shimadzu Corp Ion source device for chemical ionization

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177848A (en) * 1983-03-28 1984-10-08 Shimadzu Corp Ion source device for chemical ionization
JPH0357573B2 (en) * 1983-03-28 1991-09-02 Shimadzu Corp

Also Published As

Publication number Publication date
JPS5845781B2 (en) 1983-10-12

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