JPS54139789A - Ion source apparatus - Google Patents
Ion source apparatusInfo
- Publication number
- JPS54139789A JPS54139789A JP4662478A JP4662478A JPS54139789A JP S54139789 A JPS54139789 A JP S54139789A JP 4662478 A JP4662478 A JP 4662478A JP 4662478 A JP4662478 A JP 4662478A JP S54139789 A JPS54139789 A JP S54139789A
- Authority
- JP
- Japan
- Prior art keywords
- orifice
- hole
- ion beam
- bypass
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
PURPOSE: To make possible radiation of ion beams in a stable state by providing a bypass hole for ion beam in anode or orifice so that even if the hole diameter of the orifice of the ion source changes the ion source is held always at an optimum vacuum degree.
CONSTITUTION: An anode 3 is disposed in the light end portion of an intermediate electrode and is provided with an orifice 4 for emission of ion beam, where an ion beam exit hole 5 is formed. Leading-out of a fine ion beam entails exchanging of the exit hole 5 to an orifice of a smaller diameter and this results in decreased exhaust conductance. In order to correct this decrease in the exhaust conductance, it is exchanged with an anode 3 formed with a bypass hole 12 which becomes a bypass of the exit hole 5 or the one formed with the bypass hole in the orifice 4 itself. This bypass hole 12 enables the adequate exhaust conductance of vacuum exhaust to be maintained even if the diameter of the orifice 4 becomes smaller, thus enabling a desired vacuum degree to be maintained and the stable ion beam to be drawn out.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53046624A JPS5845781B2 (en) | 1978-04-21 | 1978-04-21 | ion source device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53046624A JPS5845781B2 (en) | 1978-04-21 | 1978-04-21 | ion source device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54139789A true JPS54139789A (en) | 1979-10-30 |
JPS5845781B2 JPS5845781B2 (en) | 1983-10-12 |
Family
ID=12752436
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53046624A Expired JPS5845781B2 (en) | 1978-04-21 | 1978-04-21 | ion source device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5845781B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59177848A (en) * | 1983-03-28 | 1984-10-08 | Shimadzu Corp | Ion source device for chemical ionization |
-
1978
- 1978-04-21 JP JP53046624A patent/JPS5845781B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59177848A (en) * | 1983-03-28 | 1984-10-08 | Shimadzu Corp | Ion source device for chemical ionization |
JPH0357573B2 (en) * | 1983-03-28 | 1991-09-02 | Shimadzu Corp |
Also Published As
Publication number | Publication date |
---|---|
JPS5845781B2 (en) | 1983-10-12 |
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