JPS53144676A - Electron beam mask and production of the same - Google Patents
Electron beam mask and production of the sameInfo
- Publication number
- JPS53144676A JPS53144676A JP5887877A JP5887877A JPS53144676A JP S53144676 A JPS53144676 A JP S53144676A JP 5887877 A JP5887877 A JP 5887877A JP 5887877 A JP5887877 A JP 5887877A JP S53144676 A JPS53144676 A JP S53144676A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- production
- same
- beam mask
- easy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To produce an electron beam mask which has mechanical strength to obviate deflecting at the central part, is easy to fix to a holding jig and is easy to handle.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5887877A JPS53144676A (en) | 1977-05-23 | 1977-05-23 | Electron beam mask and production of the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5887877A JPS53144676A (en) | 1977-05-23 | 1977-05-23 | Electron beam mask and production of the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53144676A true JPS53144676A (en) | 1978-12-16 |
Family
ID=13097006
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5887877A Pending JPS53144676A (en) | 1977-05-23 | 1977-05-23 | Electron beam mask and production of the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53144676A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56120129A (en) * | 1979-12-27 | 1981-09-21 | Sacher Rudolf Gmbh | Mask without support and method of manufacturing same |
WO1990011614A1 (en) * | 1989-03-24 | 1990-10-04 | Hitachi, Ltd. | Method of exposure to charged beam, apparatus therefor, aperture diaphragm and method of producing the same |
US5334845A (en) * | 1989-03-24 | 1994-08-02 | Hitachi Limited | Charged beam exposure method and apparatus as well as aperture stop and production method thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5334459A (en) * | 1976-09-10 | 1978-03-31 | Mitsubishi Electric Corp | Color cathode ray tube |
-
1977
- 1977-05-23 JP JP5887877A patent/JPS53144676A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5334459A (en) * | 1976-09-10 | 1978-03-31 | Mitsubishi Electric Corp | Color cathode ray tube |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56120129A (en) * | 1979-12-27 | 1981-09-21 | Sacher Rudolf Gmbh | Mask without support and method of manufacturing same |
JPS6331099B2 (en) * | 1979-12-27 | 1988-06-22 | Rudorufu Zatsuhyaa | |
WO1990011614A1 (en) * | 1989-03-24 | 1990-10-04 | Hitachi, Ltd. | Method of exposure to charged beam, apparatus therefor, aperture diaphragm and method of producing the same |
US5334845A (en) * | 1989-03-24 | 1994-08-02 | Hitachi Limited | Charged beam exposure method and apparatus as well as aperture stop and production method thereof |
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