JPS53144676A - Electron beam mask and production of the same - Google Patents

Electron beam mask and production of the same

Info

Publication number
JPS53144676A
JPS53144676A JP5887877A JP5887877A JPS53144676A JP S53144676 A JPS53144676 A JP S53144676A JP 5887877 A JP5887877 A JP 5887877A JP 5887877 A JP5887877 A JP 5887877A JP S53144676 A JPS53144676 A JP S53144676A
Authority
JP
Japan
Prior art keywords
electron beam
production
same
beam mask
easy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5887877A
Other languages
Japanese (ja)
Inventor
Kiichi Takamoto
Kunio Koyabu
Yoshiaki Mimura
Hideo Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP5887877A priority Critical patent/JPS53144676A/en
Publication of JPS53144676A publication Critical patent/JPS53144676A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To produce an electron beam mask which has mechanical strength to obviate deflecting at the central part, is easy to fix to a holding jig and is easy to handle.
COPYRIGHT: (C)1978,JPO&Japio
JP5887877A 1977-05-23 1977-05-23 Electron beam mask and production of the same Pending JPS53144676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5887877A JPS53144676A (en) 1977-05-23 1977-05-23 Electron beam mask and production of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5887877A JPS53144676A (en) 1977-05-23 1977-05-23 Electron beam mask and production of the same

Publications (1)

Publication Number Publication Date
JPS53144676A true JPS53144676A (en) 1978-12-16

Family

ID=13097006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5887877A Pending JPS53144676A (en) 1977-05-23 1977-05-23 Electron beam mask and production of the same

Country Status (1)

Country Link
JP (1) JPS53144676A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56120129A (en) * 1979-12-27 1981-09-21 Sacher Rudolf Gmbh Mask without support and method of manufacturing same
WO1990011614A1 (en) * 1989-03-24 1990-10-04 Hitachi, Ltd. Method of exposure to charged beam, apparatus therefor, aperture diaphragm and method of producing the same
US5334845A (en) * 1989-03-24 1994-08-02 Hitachi Limited Charged beam exposure method and apparatus as well as aperture stop and production method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5334459A (en) * 1976-09-10 1978-03-31 Mitsubishi Electric Corp Color cathode ray tube

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5334459A (en) * 1976-09-10 1978-03-31 Mitsubishi Electric Corp Color cathode ray tube

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56120129A (en) * 1979-12-27 1981-09-21 Sacher Rudolf Gmbh Mask without support and method of manufacturing same
JPS6331099B2 (en) * 1979-12-27 1988-06-22 Rudorufu Zatsuhyaa
WO1990011614A1 (en) * 1989-03-24 1990-10-04 Hitachi, Ltd. Method of exposure to charged beam, apparatus therefor, aperture diaphragm and method of producing the same
US5334845A (en) * 1989-03-24 1994-08-02 Hitachi Limited Charged beam exposure method and apparatus as well as aperture stop and production method thereof

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