JPS54139478A - Pressing/heating process method for semiconductor substrate - Google Patents
Pressing/heating process method for semiconductor substrateInfo
- Publication number
- JPS54139478A JPS54139478A JP4670678A JP4670678A JPS54139478A JP S54139478 A JPS54139478 A JP S54139478A JP 4670678 A JP4670678 A JP 4670678A JP 4670678 A JP4670678 A JP 4670678A JP S54139478 A JPS54139478 A JP S54139478A
- Authority
- JP
- Japan
- Prior art keywords
- valve
- capsule
- quartz
- reaction
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4670678A JPS54139478A (en) | 1978-04-21 | 1978-04-21 | Pressing/heating process method for semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4670678A JPS54139478A (en) | 1978-04-21 | 1978-04-21 | Pressing/heating process method for semiconductor substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54139478A true JPS54139478A (en) | 1979-10-29 |
JPS5628011B2 JPS5628011B2 (enrdf_load_stackoverflow) | 1981-06-29 |
Family
ID=12754799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4670678A Granted JPS54139478A (en) | 1978-04-21 | 1978-04-21 | Pressing/heating process method for semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54139478A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58179133U (ja) * | 1982-05-24 | 1983-11-30 | 国方 弘文 | 手の経穴押圧手袋 |
JPS6145936U (ja) * | 1984-08-29 | 1986-03-27 | 株式会社 エ−ル | 健康靴下 |
JPS649642U (enrdf_load_stackoverflow) * | 1987-07-09 | 1989-01-19 |
-
1978
- 1978-04-21 JP JP4670678A patent/JPS54139478A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5628011B2 (enrdf_load_stackoverflow) | 1981-06-29 |
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