JPS54139478A - Pressing/heating process method for semiconductor substrate - Google Patents

Pressing/heating process method for semiconductor substrate

Info

Publication number
JPS54139478A
JPS54139478A JP4670678A JP4670678A JPS54139478A JP S54139478 A JPS54139478 A JP S54139478A JP 4670678 A JP4670678 A JP 4670678A JP 4670678 A JP4670678 A JP 4670678A JP S54139478 A JPS54139478 A JP S54139478A
Authority
JP
Japan
Prior art keywords
valve
capsule
quartz
reaction
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4670678A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5628011B2 (enrdf_load_stackoverflow
Inventor
Mikio Takagi
Mamoru Maeda
Akira Fujinuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4670678A priority Critical patent/JPS54139478A/ja
Publication of JPS54139478A publication Critical patent/JPS54139478A/ja
Publication of JPS5628011B2 publication Critical patent/JPS5628011B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP4670678A 1978-04-21 1978-04-21 Pressing/heating process method for semiconductor substrate Granted JPS54139478A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4670678A JPS54139478A (en) 1978-04-21 1978-04-21 Pressing/heating process method for semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4670678A JPS54139478A (en) 1978-04-21 1978-04-21 Pressing/heating process method for semiconductor substrate

Publications (2)

Publication Number Publication Date
JPS54139478A true JPS54139478A (en) 1979-10-29
JPS5628011B2 JPS5628011B2 (enrdf_load_stackoverflow) 1981-06-29

Family

ID=12754799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4670678A Granted JPS54139478A (en) 1978-04-21 1978-04-21 Pressing/heating process method for semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS54139478A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58179133U (ja) * 1982-05-24 1983-11-30 国方 弘文 手の経穴押圧手袋
JPS6145936U (ja) * 1984-08-29 1986-03-27 株式会社 エ−ル 健康靴下
JPS649642U (enrdf_load_stackoverflow) * 1987-07-09 1989-01-19

Also Published As

Publication number Publication date
JPS5628011B2 (enrdf_load_stackoverflow) 1981-06-29

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