JPS54137278A - Manufacture of emulsion photo mask - Google Patents

Manufacture of emulsion photo mask

Info

Publication number
JPS54137278A
JPS54137278A JP4485378A JP4485378A JPS54137278A JP S54137278 A JPS54137278 A JP S54137278A JP 4485378 A JP4485378 A JP 4485378A JP 4485378 A JP4485378 A JP 4485378A JP S54137278 A JPS54137278 A JP S54137278A
Authority
JP
Japan
Prior art keywords
solution
photo mask
development
plate
emulsion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4485378A
Other languages
Japanese (ja)
Inventor
Masahiko Adachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4485378A priority Critical patent/JPS54137278A/en
Publication of JPS54137278A publication Critical patent/JPS54137278A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To avoid the uneven devolopment or the faulty development and thus to obtain a high-quality mask by giving the ultrasonic wave to the developing solution when forming the photo mask through exposure and development applied to the emulsion layer provided on the transparent substrate.
CONSTITUTION: Ultrasonic wave generator 4 is coupled to developing solution tank 2 storing developing solution 3, and dry plate 1 composed of the emulsion layer as well as the transparent substrate which is through with the exposure process are soaked into solution 3. Then generator 4 is actuated to stip up solution 3, and at the same time, the ultrasonic vibrarions are applied to plate 1 through solution 3. In such way, new solution 3 is always through plate 1, thus reducing extremely the occurrence of pinholes and uneven development. Thus, a high-quality emulsion photo mask can be obtained.
COPYRIGHT: (C)1979,JPO&Japio
JP4485378A 1978-04-18 1978-04-18 Manufacture of emulsion photo mask Pending JPS54137278A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4485378A JPS54137278A (en) 1978-04-18 1978-04-18 Manufacture of emulsion photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4485378A JPS54137278A (en) 1978-04-18 1978-04-18 Manufacture of emulsion photo mask

Publications (1)

Publication Number Publication Date
JPS54137278A true JPS54137278A (en) 1979-10-24

Family

ID=12703033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4485378A Pending JPS54137278A (en) 1978-04-18 1978-04-18 Manufacture of emulsion photo mask

Country Status (1)

Country Link
JP (1) JPS54137278A (en)

Similar Documents

Publication Publication Date Title
JPS537231A (en) Image formation
JPS5560944A (en) Image forming method
JPS5569265A (en) Pattern-forming method
JPS5355122A (en) Color photographic material
JPS51120214A (en) Photo-material including antihalation layer
JPS54137278A (en) Manufacture of emulsion photo mask
JPS5381120A (en) Direct positive image formation process
JPS5312274A (en) Production of mask for x-ray exposure
JPS53120527A (en) Forming method of positive type radiation sensitive material layer
JPS5276343A (en) Method of manufacturing goods with abrasion resistant film
JPS5580323A (en) Pattern forming method for photoresist-film
JPS5480069A (en) Light absorbing film coating method for color picture tube
JPS52127170A (en) Mask for patterning
JPS5269270A (en) Coating method of photoresist
JPS5618420A (en) Manufacture of semiconductor device
JPS5380994A (en) Lift-off method
JPS57136646A (en) Positive type photoresist developing method
JPS5512921A (en) Photoengraving process
JPS5482968A (en) Developing method for fluorescent substance slurry
JPS5515125A (en) Halftone gravure engraving method
JPS56119130A (en) Manufacture of easily corrigible screen printing plate
JPS5465037A (en) Developing method for photosensitive resin by oxygen plasma
JPS558013A (en) Semiconductor device manufacturing method
JPS533821A (en) Exposure method
JPS5648625A (en) Photographic film unit