JPS54115675A - Semi-wet process noxious gas removing apparatus - Google Patents
Semi-wet process noxious gas removing apparatusInfo
- Publication number
- JPS54115675A JPS54115675A JP2209678A JP2209678A JPS54115675A JP S54115675 A JPS54115675 A JP S54115675A JP 2209678 A JP2209678 A JP 2209678A JP 2209678 A JP2209678 A JP 2209678A JP S54115675 A JPS54115675 A JP S54115675A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- splash
- room
- absorbent
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chimneys And Flues (AREA)
- Gas Separation By Absorption (AREA)
Abstract
PURPOSE: The above-mentioned apparatus, having a good absorption capacity, composed of absorption room absorbing high temperature noxious gas in the splash of absorbent slurry and rotary drier having many chains collecting the splash and being needless to provide draining treatment or reheating apparatus.
CONSTITUTION: For example, about 300°C of the exhaust gas 13 containing HCl generated from incinerator, is introduced from the opening 4 to the absorption room 9. On the one hand, a fixed quantity of the Ca(OH)2 slurry liquid 7 used as absorbent, is jetted on the surface of the rotating disk for spray 5 rotating at high speed and splash of absorbent is formed by turning force of the disk 5 in the room 9. Then, noxious substance in the gas 13, such as HCl etc., introduced from the opening 4 into the room 9, is absorbed by the splash of absorbent and at the same time, temperature of the gas 13 is lowered at 150W160°C. Next, the slurry splash entered in the rotary drier 2, is collected by the layer of the chain 10. Reaction product, such as CaCO3 etc., adhered on the chain 10, is dried and is sent to the chamber 3 as powdered product. Then, the treated gas 14 is purified and is discharged after sending out the gas 14 from the opening 11 to the dust collecting room.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2209678A JPS54115675A (en) | 1978-03-01 | 1978-03-01 | Semi-wet process noxious gas removing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2209678A JPS54115675A (en) | 1978-03-01 | 1978-03-01 | Semi-wet process noxious gas removing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54115675A true JPS54115675A (en) | 1979-09-08 |
Family
ID=12073337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2209678A Pending JPS54115675A (en) | 1978-03-01 | 1978-03-01 | Semi-wet process noxious gas removing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54115675A (en) |
-
1978
- 1978-03-01 JP JP2209678A patent/JPS54115675A/en active Pending
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