JPS54112173A - Electron beam system - Google Patents

Electron beam system

Info

Publication number
JPS54112173A
JPS54112173A JP78479A JP78479A JPS54112173A JP S54112173 A JPS54112173 A JP S54112173A JP 78479 A JP78479 A JP 78479A JP 78479 A JP78479 A JP 78479A JP S54112173 A JPS54112173 A JP S54112173A
Authority
JP
Japan
Prior art keywords
electron beam
beam system
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP78479A
Other languages
English (en)
Other versions
JPS6222260B2 (ja
Inventor
Drew Edward Albrecht
Samuel Kay Doran
Michel Salib Michail
Hannon Stanley Yourke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS54112173A publication Critical patent/JPS54112173A/ja
Publication of JPS6222260B2 publication Critical patent/JPS6222260B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP78479A 1978-02-13 1979-01-10 Electron beam system Granted JPS54112173A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/877,198 US4137459A (en) 1978-02-13 1978-02-13 Method and apparatus for applying focus correction in E-beam system

Publications (2)

Publication Number Publication Date
JPS54112173A true JPS54112173A (en) 1979-09-01
JPS6222260B2 JPS6222260B2 (ja) 1987-05-16

Family

ID=25369456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP78479A Granted JPS54112173A (en) 1978-02-13 1979-01-10 Electron beam system

Country Status (4)

Country Link
US (1) US4137459A (ja)
EP (1) EP0003527B1 (ja)
JP (1) JPS54112173A (ja)
DE (1) DE2962859D1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635739A (en) * 1979-08-31 1981-04-08 Kubota Ltd High-nickel high-hardness corrosion resistant alloy for electrically conductive roll
JPS5635740A (en) * 1979-08-31 1981-04-08 Kubota Ltd High-nickel high-hardness corrosion resistant alloy for electrically conductive roll
JPS5648135A (en) * 1979-09-28 1981-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Painting for electron beam and device therefor
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS59114818A (ja) * 1982-12-21 1984-07-03 Toshiba Corp 電子ビ−ムパタ−ン描画方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
US4357540A (en) * 1980-12-19 1982-11-02 International Business Machines Corporation Semiconductor device array mask inspection method and apparatus
JPS59150422A (ja) * 1983-01-31 1984-08-28 Fujitsu Ltd 露光処理方法
US4788431A (en) * 1987-04-10 1988-11-29 The Perkin-Elmer Corporation Specimen distance measuring system
US5304811A (en) * 1991-08-09 1994-04-19 Fujitsu Ltd. Lithography system using charged-particle beam and method of using the same
US5391886A (en) * 1991-08-09 1995-02-21 Fujitsu Limited Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system
JP3455006B2 (ja) * 1996-03-25 2003-10-06 株式会社東芝 荷電粒子ビーム装置
US9338363B1 (en) 2014-11-06 2016-05-10 General Electric Company Method and system for magnification correction from multiple focus planes

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS497700A (ja) * 1972-05-26 1974-01-23
JPS5223221A (en) * 1975-08-14 1977-02-22 Siemens Ag Code generator

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3900736A (en) * 1974-01-28 1975-08-19 Ibm Method and apparatus for positioning a beam of charged particles
US3924156A (en) * 1974-06-26 1975-12-02 Ibm Method and system for correcting an aberration of a beam of charged particles

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS497700A (ja) * 1972-05-26 1974-01-23
JPS5223221A (en) * 1975-08-14 1977-02-22 Siemens Ag Code generator

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635739A (en) * 1979-08-31 1981-04-08 Kubota Ltd High-nickel high-hardness corrosion resistant alloy for electrically conductive roll
JPS5635740A (en) * 1979-08-31 1981-04-08 Kubota Ltd High-nickel high-hardness corrosion resistant alloy for electrically conductive roll
JPS6332857B2 (ja) * 1979-08-31 1988-07-01 Kubota Ltd
JPS5648135A (en) * 1979-09-28 1981-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Painting for electron beam and device therefor
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS59114818A (ja) * 1982-12-21 1984-07-03 Toshiba Corp 電子ビ−ムパタ−ン描画方法
JPH058566B2 (ja) * 1982-12-21 1993-02-02 Tokyo Shibaura Electric Co

Also Published As

Publication number Publication date
EP0003527A3 (en) 1979-09-05
EP0003527A2 (de) 1979-08-22
EP0003527B1 (de) 1982-05-19
US4137459A (en) 1979-01-30
JPS6222260B2 (ja) 1987-05-16
DE2962859D1 (en) 1982-07-08

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