JPS54110938A - Method and apparatus for controlling film thickness - Google Patents
Method and apparatus for controlling film thicknessInfo
- Publication number
- JPS54110938A JPS54110938A JP1895878A JP1895878A JPS54110938A JP S54110938 A JPS54110938 A JP S54110938A JP 1895878 A JP1895878 A JP 1895878A JP 1895878 A JP1895878 A JP 1895878A JP S54110938 A JPS54110938 A JP S54110938A
- Authority
- JP
- Japan
- Prior art keywords
- light
- wave
- signal light
- base plate
- length
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title abstract 3
- 230000003595 spectral effect Effects 0.000 abstract 4
- 239000011521 glass Substances 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 1
- 230000035699 permeability Effects 0.000 abstract 1
- 238000001228 spectrum Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Insulating Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Filters (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1895878A JPS54110938A (en) | 1978-02-20 | 1978-02-20 | Method and apparatus for controlling film thickness |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1895878A JPS54110938A (en) | 1978-02-20 | 1978-02-20 | Method and apparatus for controlling film thickness |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54110938A true JPS54110938A (en) | 1979-08-30 |
JPS627266B2 JPS627266B2 (enrdf_load_stackoverflow) | 1987-02-16 |
Family
ID=11986145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1895878A Granted JPS54110938A (en) | 1978-02-20 | 1978-02-20 | Method and apparatus for controlling film thickness |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54110938A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59166689A (ja) * | 1982-12-17 | 1984-09-20 | ソルベイ・アンド・コンパニ−(ソシエテ・アノニム) | 水素の電解製造用の陰極 |
WO2008048136A1 (fr) * | 2006-10-18 | 2008-04-24 | Federalnoe Gosudarstvennoe Obrazovatelnoe Uchrezhdenie Vyschego Professionalnogo Obrazovaniya 'rossysky Gosudarstvenny Universitet Im. I. Kanta' | Procédé pour contrôler l'épaisseur d'un film pendant son application par dépôt dans une chambre à vide |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH026989U (enrdf_load_stackoverflow) * | 1988-06-27 | 1990-01-17 |
-
1978
- 1978-02-20 JP JP1895878A patent/JPS54110938A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59166689A (ja) * | 1982-12-17 | 1984-09-20 | ソルベイ・アンド・コンパニ−(ソシエテ・アノニム) | 水素の電解製造用の陰極 |
WO2008048136A1 (fr) * | 2006-10-18 | 2008-04-24 | Federalnoe Gosudarstvennoe Obrazovatelnoe Uchrezhdenie Vyschego Professionalnogo Obrazovaniya 'rossysky Gosudarstvenny Universitet Im. I. Kanta' | Procédé pour contrôler l'épaisseur d'un film pendant son application par dépôt dans une chambre à vide |
Also Published As
Publication number | Publication date |
---|---|
JPS627266B2 (enrdf_load_stackoverflow) | 1987-02-16 |
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