JPS54109391A - Etching method - Google Patents
Etching methodInfo
- Publication number
- JPS54109391A JPS54109391A JP758378A JP758378A JPS54109391A JP S54109391 A JPS54109391 A JP S54109391A JP 758378 A JP758378 A JP 758378A JP 758378 A JP758378 A JP 758378A JP S54109391 A JPS54109391 A JP S54109391A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- plasma
- unit
- gas
- test piece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 title abstract 7
- 238000000034 method Methods 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 238000001312 dry etching Methods 0.000 abstract 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical group 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 238000006467 substitution reaction Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
PURPOSE:To simplify the work and to make safe the work, by adding nitrogen to the mixture of halogen substitution including fluorine and etching crystal with plasma processing, with the opposing electrode type plasma dry etching unit. CONSTITUTION:In the opposing electrode type plasma dry etching unit, etching gas of 10<-2> Torr. to several Torr. is introduced to the etching chamber, high frequency power is applied between two electrodes placed parallelly in the etching chamber, processing plasma for the etching gas, and the test piece on the electrode plate is etched with this gas plasma. Since the electrodes are located parallelly in this unit, efficient etching can be made because almost vertical power is exerted on the test piece.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP758378A JPS54109391A (en) | 1978-01-26 | 1978-01-26 | Etching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP758378A JPS54109391A (en) | 1978-01-26 | 1978-01-26 | Etching method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS54109391A true JPS54109391A (en) | 1979-08-27 |
Family
ID=11669822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP758378A Pending JPS54109391A (en) | 1978-01-26 | 1978-01-26 | Etching method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54109391A (en) |
-
1978
- 1978-01-26 JP JP758378A patent/JPS54109391A/en active Pending
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