JPS54103552A - Pattern formation method - Google Patents

Pattern formation method

Info

Publication number
JPS54103552A
JPS54103552A JP926378A JP926378A JPS54103552A JP S54103552 A JPS54103552 A JP S54103552A JP 926378 A JP926378 A JP 926378A JP 926378 A JP926378 A JP 926378A JP S54103552 A JPS54103552 A JP S54103552A
Authority
JP
Japan
Prior art keywords
formation method
pattern formation
pattern
formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP926378A
Other languages
English (en)
Other versions
JPS5625790B2 (ja
Inventor
Ken Tsutsui
Akira Sasano
Toshio Nakano
Haruo Matsumaru
Eiichi Maruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Denshi KK
Hitachi Ltd
Original Assignee
Hitachi Denshi KK
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Denshi KK, Hitachi Ltd filed Critical Hitachi Denshi KK
Priority to JP926378A priority Critical patent/JPS54103552A/ja
Priority to FR7901901A priority patent/FR2416500B1/fr
Priority to CA320,564A priority patent/CA1111144A/en
Priority to DE2903872A priority patent/DE2903872C2/de
Priority to NL7900828A priority patent/NL7900828A/xx
Priority to GB7903579A priority patent/GB2015036B/en
Priority to US06/008,587 priority patent/US4273812A/en
Publication of JPS54103552A publication Critical patent/JPS54103552A/ja
Publication of JPS5625790B2 publication Critical patent/JPS5625790B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/143—Masks therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP926378A 1978-02-01 1978-02-01 Pattern formation method Granted JPS54103552A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP926378A JPS54103552A (en) 1978-02-01 1978-02-01 Pattern formation method
FR7901901A FR2416500B1 (fr) 1978-02-01 1979-01-25 Methode de production d'images materielles
CA320,564A CA1111144A (en) 1978-02-01 1979-01-31 Method of producing material pattern
DE2903872A DE2903872C2 (de) 1978-02-01 1979-02-01 Verfahren zur Ausbildung von Mustern mittels Maskenbedampfungstechnik
NL7900828A NL7900828A (nl) 1978-02-01 1979-02-01 Werkwijze voor de vorming van materiaalpatronen.
GB7903579A GB2015036B (en) 1978-02-01 1979-02-01 Forming a pattern of material on a substrate
US06/008,587 US4273812A (en) 1978-02-01 1979-02-01 Method of producing material patterns by evaporating material through a perforated mask having a reinforcing bridge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP926378A JPS54103552A (en) 1978-02-01 1978-02-01 Pattern formation method

Publications (2)

Publication Number Publication Date
JPS54103552A true JPS54103552A (en) 1979-08-15
JPS5625790B2 JPS5625790B2 (ja) 1981-06-15

Family

ID=11715536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP926378A Granted JPS54103552A (en) 1978-02-01 1978-02-01 Pattern formation method

Country Status (7)

Country Link
US (1) US4273812A (ja)
JP (1) JPS54103552A (ja)
CA (1) CA1111144A (ja)
DE (1) DE2903872C2 (ja)
FR (1) FR2416500B1 (ja)
GB (1) GB2015036B (ja)
NL (1) NL7900828A (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4451344A (en) * 1982-03-26 1984-05-29 International Business Machines Corp. Method of making edge protected ferrite core
US4418473A (en) * 1982-03-26 1983-12-06 International Business Machines Corp. Method of making edge protected ferrite core
US4511599A (en) * 1983-03-01 1985-04-16 Sigmatron Associates Mask for vacuum depositing back metal electrodes on EL panel
US4536419A (en) * 1983-03-10 1985-08-20 Hitachi, Ltd. Method for forming tapered films
US4574093A (en) * 1983-12-30 1986-03-04 At&T Bell Laboratories Deposition technique
US4776868A (en) * 1985-09-09 1988-10-11 Corning Glass Works Lenses and lens arrays
US4715940A (en) * 1985-10-23 1987-12-29 Gte Products Corporation Mask for patterning electrode structures in thin film EL devices
US4915057A (en) * 1985-10-23 1990-04-10 Gte Products Corporation Apparatus and method for registration of shadow masked thin-film patterns
US4746548A (en) * 1985-10-23 1988-05-24 Gte Products Corporation Method for registration of shadow masked thin-film patterns
US4615781A (en) * 1985-10-23 1986-10-07 Gte Products Corporation Mask assembly having mask stress relieving feature
US5003870A (en) * 1989-08-21 1991-04-02 Hughes Aircraft Company Antistretch screen printing arrangement
US5389397A (en) * 1989-08-29 1995-02-14 North American Philips Corporation Method for controlling the thickness distribution of a deposited layer
US5643629A (en) * 1991-05-20 1997-07-01 Sauerland; Franz L. Method for adjusting center frequency and bandwidth of monolithic filters by plating through a single-aperture mask on a single side of the filters electrode pattern to plate selected areas of the pattern
US6469439B2 (en) * 1999-06-15 2002-10-22 Toray Industries, Inc. Process for producing an organic electroluminescent device
US6712943B2 (en) * 2001-11-06 2004-03-30 The Boc Group, Inc. Methods for angle limiting deposition mask
DE602006008850D1 (de) * 2005-03-30 2009-10-15 Brother Ind Ltd Abscheidungsmaske
US7867904B2 (en) * 2006-07-19 2011-01-11 Intermolecular, Inc. Method and system for isolated and discretized process sequence integration
US11035033B2 (en) * 2017-10-24 2021-06-15 Emagin Corporation Direct-deposition system including standoffs for controlling substrate-mask separation

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5025911A (ja) * 1973-03-22 1975-03-18

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2676114A (en) * 1951-06-08 1954-04-20 Libbey Owens Ford Glass Co Method of producing graded coatings
DE1446197A1 (de) * 1959-04-27 1969-05-29 Licentia Gmbh Blende zur Begrenzung von unter vermindertem Druck zu bedampfenden Flaechen
NL276676A (ja) * 1961-04-13
US3193408A (en) * 1961-08-22 1965-07-06 David P Triller Method for producing integrated circuitry components
NL294779A (ja) * 1962-07-20
DE1272680B (de) * 1963-09-16 1968-07-11 Halbleiterwerk Frankfurt Oder Vorrichtung zum Vakuumaufdampfen von Schichten auf eine grosse Anzahl von mit Masken abgedeckten Unterlagen
US3326718A (en) * 1963-12-30 1967-06-20 Hughes Aircraft Co Method for making an electrical capacitor
DE1521536A1 (de) * 1965-12-21 1969-09-11 Telefunken Patent Verfahren zum Herstellen mehrerer,uebereinander liegender Schichten
US3510349A (en) * 1966-11-15 1970-05-05 Us Air Force Vacuum deposited interconnection matrix
CH489620A (de) * 1967-10-02 1970-04-30 Stanniolfabrik Burgdorf Ag Vorrichtung zur Erzielung scharf begrenzter nicht metallisierter Streifen beim Aufdampfen im Hochvakuum auf eine um eine Kühlwalze laufende Trägerbahn in einer kontinuierlich arbeitenden Bedampfungsanlage
US3799792A (en) * 1971-12-14 1974-03-26 Texas Instruments Inc Vapor deposition method
US4049857A (en) * 1976-07-28 1977-09-20 International Business Machines Corporation Deposition mask and methods of making same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5025911A (ja) * 1973-03-22 1975-03-18

Also Published As

Publication number Publication date
NL7900828A (nl) 1979-08-03
JPS5625790B2 (ja) 1981-06-15
GB2015036B (en) 1982-06-09
GB2015036A (en) 1979-09-05
DE2903872C2 (de) 1983-09-29
US4273812A (en) 1981-06-16
DE2903872A1 (de) 1979-08-02
FR2416500B1 (fr) 1986-12-26
FR2416500A1 (fr) 1979-08-31
CA1111144A (en) 1981-10-20

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