JPS54100668A - Electron-beam exposure unit - Google Patents

Abstract

PURPOSE:To draw patterns on several exposed materials by an electron beam with high precision by holding exposed materials in respective chambers at constant temperature with an exposure chamber linked with a stand-by chamber. CONSTITUTION:Constant-temperature water from constant-temperature water bath 9 of 25 deg.C flows from intake 10 into wall 22 of exposure chamber 2 and the water channel in desk 21, thereby holding the wall at constant temperature. The wall of stand-by chamber 6 is adjusted to the constant temperature from intake 12. Chambers 2 and 3 are evacuated highly and exposed material 3 can be controlled at approximate + or -0.1 deg.C through thermal conducting radiation from the wall. The constant-temperature water returns from outlets 11 and 13 to bath 9. Into the upper wall of chamber 2 and the flank of chamber 6, temperature sensors 31 and 32 are inserted to detect the temperature, thereby controlling. the flow of the constant-temperature water and its temperature. From the opening part of sluice valve 5, material 3 in exposure chamber 2 is taken out into stand-by chamber 6, and placed into magazine 8, and a waiting material mounted on desk 4, by operation rod 14 so that a pattern will be drawn with valve 5 closed. A material on which a pattern is drawn next is held at the constant temperature in the stand-by chamber, so that drawing can be attained immediately and efficiently.