JPS5873120A - Electron-beam lithography device - Google Patents

Abstract

PURPOSE:To increase the temperature stability of a sampling chamber by a method wherein heat insulation between the sampling chamber and a surface plate is contrived and heat input from the surface plate is checked as much as possible and the heat capacity of the sampling chamber is also minimized as much as possible. CONSTITUTION:A preparatory chamber 2, a flange 3, a driving section 4, a lens barrel 5 and a pump 8 are provided and a sampling chamber 1 is fixed by inserting an intermediate member 7 made by suitable metal between the sampling chamber 1 and a surface plate 6. A structure is made to permit the flow of constant-temperature water in the metal and the metal member itself is maintained at a constant temperature. This improves the temperature stability of the sampling chamber to decrease heat variation from the surface plate.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam lithography apparatus that has good temperature stability and is highly efficient.

In recent years, electron beam lithography systems have been developed to form fine patterns on samples such as semiconductor wafers and mask substrates. This f & position is placed in the sample car and irradiates the sample with an electron beam from the electron beam optics tube to expose the resist on the sample, which is extremely effective for forming the flL thin butter 7. .

However, the following wholesalers exist for conventional equipment as shown in Figure 1. In other words, the temperature of the entire device changes depending on the temperature change in the room.
m is also deformed (thermal expansion coefficient 17.I x 10
/'O), therefore, there was a drawback that the dimensional degree of the napmicron could not be ensured with good reproducibility due to the R shape of the material due to temperature changes.

Conventionally, the solution to this problem is to use sample chamber 1. In the preliminary chamber 2°-Urajo, constant-temperature water is poured into the phase fan 3, etc., to maintain a constant temperature, and the temperature change due to disturbance is controlled by the drive unit 4. We have been dealing with the fever from @@5. However, the sample chamber and the constant plate 6 must be fixed, and the mass of the plate is large, so the heat capacity of the constant rounding is very large. For this reason, the thermal time constant was large and it was sometimes difficult to set a constant temperature.

Furthermore, the surface plate has a large surface area and is easily affected by external heat, which is a problem. Such problems are not limited to electron beam lithography apparatuses, but also apply to ion beam lithography apparatuses.

The present invention has been made in view of the above circumstances, and its purpose is to improve the thermal insulation between the sample chamber and the surface plate, to suppress the heat input from the surface plate as much as possible, and to increase the heat capacity of the sample chamber. It is an object of the present invention to provide a high-quality electron beam extraction and imaging device in which the temperature of the paper stock can be easily controlled by making the temperature as small as possible.

First, the present invention will be explained in detail. Effective temperature control without changing the capacity of conventional constant-temperature equipment can be achieved by providing thermal insulation between the sample chamber and the surface plate. This allows the surface plate and the sample chamber to be thermally separated.

The present invention provides a simple way to accomplish this thermal insulation.

The present invention will be explained below by way of examples with reference to the drawings.

FIG. 2 is a sectional view of a device showing a simple embodiment of the present invention. The sample ill is fixed to the surface plate 6 via an intermediate member 7 made of a suitable metal.

This metal has a structure that allows constant temperature water to flow and maintains itself at a constant temperature.
2 is the pre-*ii, 3 is the 72 inch, 4 is the drive unit, 5 is the lens barrel,
8 is a pump. The intermediate material 7 can also be made of a material with very poor thermal conductivity, such as Cefmic, without flowing constant-temperature water, so that the objective (1") can be achieved! I understand.

However, the present invention is not limited to the nine embodiments described above. There are many ways to run constant temperature water through the material placed under the sample chamber. 9. When using an insulating material, there are many possibilities other than ceramic. In short, various modifications may be made without departing from the gist of the present invention, which is to provide thermal insulation between the sample chamber and the surface plate. With this configuration, the temperature stability of the sample chamber was significantly improved, and thermal fluctuations from the surface plate were reduced. Furthermore, it is possible to reduce the capacity of the constant a device (1tt-), which is useful for cost-effectiveness. The time required for temperature stabilization is shortened because only the heat capacity of the sample voltage is required when starting up the Maku equipment.
There are many advantages such as IIIJI can be done in a very short time.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional view of a conventional device, and FIG. 2 is a cross-sectional view of a device according to an embodiment of the present invention. 1...Sample room, 2...Preliminary constitution. 3... 7 lunges, 4... Drive section. 5... Lens tube, 6... Surface plate. 7...Intermediate material, 8...Pump. Agent: Patent attorney Noriyuki Chika and 1 other person

Claims (3)

[Claims] (1) Consists of an electron beam optical column, a sample chamber where the sample is placed and kept empty, a preliminary chamber, a drive source necessary to drive the device, and a surface plate on which these structures are placed. An electron beam lithography apparatus characterized in that a hot wire member is used between the sample chamber and the surface plate in the electron beam lithography system. (2) The electron beam lithography apparatus according to claim 1, wherein the heat insulating member is made of ceramic. (3) Special #I characterized by passing constant temperature water through the heat insulating member! The electron beam lithography apparatus described in the @curved section and the second column of F-claim.