JPS5398775A - Gas phase growth unit - Google Patents
Gas phase growth unitInfo
- Publication number
- JPS5398775A JPS5398775A JP1243377A JP1243377A JPS5398775A JP S5398775 A JPS5398775 A JP S5398775A JP 1243377 A JP1243377 A JP 1243377A JP 1243377 A JP1243377 A JP 1243377A JP S5398775 A JPS5398775 A JP S5398775A
- Authority
- JP
- Japan
- Prior art keywords
- gas phase
- phase growth
- growth unit
- quartz
- reaction tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1243377A JPS5398775A (en) | 1977-02-09 | 1977-02-09 | Gas phase growth unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1243377A JPS5398775A (en) | 1977-02-09 | 1977-02-09 | Gas phase growth unit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5398775A true JPS5398775A (en) | 1978-08-29 |
Family
ID=11805145
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1243377A Pending JPS5398775A (en) | 1977-02-09 | 1977-02-09 | Gas phase growth unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5398775A (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5588840A (en) * | 1978-12-27 | 1980-07-04 | Hitachi Ltd | Heating reaction furnace |
JPS55120130A (en) * | 1979-03-12 | 1980-09-16 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
JPS55153323A (en) * | 1979-05-17 | 1980-11-29 | Kokusai Electric Co Ltd | Depressurized epitaxial growth device |
JPS57159015A (en) * | 1981-03-26 | 1982-10-01 | Nec Corp | Film growing device |
JPS6062112A (ja) * | 1983-09-16 | 1985-04-10 | Seiko Epson Corp | ポリシリコンcvd装置 |
JPS627121A (ja) * | 1985-07-04 | 1987-01-14 | Jiro Yoshida | エピタキシヤル成長装置 |
WO2017169290A1 (ja) * | 2016-04-01 | 2017-10-05 | 信越半導体株式会社 | シリコンエピタキシャルウェーハの製造方法 |
-
1977
- 1977-02-09 JP JP1243377A patent/JPS5398775A/ja active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5588840A (en) * | 1978-12-27 | 1980-07-04 | Hitachi Ltd | Heating reaction furnace |
JPS55120130A (en) * | 1979-03-12 | 1980-09-16 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
JPS55153323A (en) * | 1979-05-17 | 1980-11-29 | Kokusai Electric Co Ltd | Depressurized epitaxial growth device |
JPS57159015A (en) * | 1981-03-26 | 1982-10-01 | Nec Corp | Film growing device |
JPS6062112A (ja) * | 1983-09-16 | 1985-04-10 | Seiko Epson Corp | ポリシリコンcvd装置 |
JPS627121A (ja) * | 1985-07-04 | 1987-01-14 | Jiro Yoshida | エピタキシヤル成長装置 |
WO2017169290A1 (ja) * | 2016-04-01 | 2017-10-05 | 信越半導体株式会社 | シリコンエピタキシャルウェーハの製造方法 |
JP2017188507A (ja) * | 2016-04-01 | 2017-10-12 | 信越半導体株式会社 | シリコンエピタキシャルウェーハの製造方法 |
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