JPS5379777A - Evaporating method for solid material in gas phase treatment - Google Patents

Evaporating method for solid material in gas phase treatment

Info

Publication number
JPS5379777A
JPS5379777A JP15676576A JP15676576A JPS5379777A JP S5379777 A JPS5379777 A JP S5379777A JP 15676576 A JP15676576 A JP 15676576A JP 15676576 A JP15676576 A JP 15676576A JP S5379777 A JPS5379777 A JP S5379777A
Authority
JP
Japan
Prior art keywords
gas phase
solid material
phase treatment
evaporating method
subliming material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15676576A
Other languages
Japanese (ja)
Inventor
Yoshiki Tanigawa
Masao Sugita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15676576A priority Critical patent/JPS5379777A/en
Publication of JPS5379777A publication Critical patent/JPS5379777A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To feed constantly a desired quantity of vapor of easily subliming material into a reaction chamber in order to grow easily uniform coating by dispersing the subliming material in a nonreactive liquid of low vapor pressure, and by bubbling the dispersed liquid with carrier gas.
JP15676576A 1976-12-25 1976-12-25 Evaporating method for solid material in gas phase treatment Pending JPS5379777A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15676576A JPS5379777A (en) 1976-12-25 1976-12-25 Evaporating method for solid material in gas phase treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15676576A JPS5379777A (en) 1976-12-25 1976-12-25 Evaporating method for solid material in gas phase treatment

Publications (1)

Publication Number Publication Date
JPS5379777A true JPS5379777A (en) 1978-07-14

Family

ID=15634814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15676576A Pending JPS5379777A (en) 1976-12-25 1976-12-25 Evaporating method for solid material in gas phase treatment

Country Status (1)

Country Link
JP (1) JPS5379777A (en)

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