JPS5366376A - Photo mask - Google Patents
Photo maskInfo
- Publication number
- JPS5366376A JPS5366376A JP14265876A JP14265876A JPS5366376A JP S5366376 A JPS5366376 A JP S5366376A JP 14265876 A JP14265876 A JP 14265876A JP 14265876 A JP14265876 A JP 14265876A JP S5366376 A JPS5366376 A JP S5366376A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- avoid
- covering
- resin film
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14265876A JPS5366376A (en) | 1976-11-26 | 1976-11-26 | Photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14265876A JPS5366376A (en) | 1976-11-26 | 1976-11-26 | Photo mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5366376A true JPS5366376A (en) | 1978-06-13 |
JPS5427707B2 JPS5427707B2 (US20110009641A1-20110113-C00185.png) | 1979-09-11 |
Family
ID=15320475
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14265876A Granted JPS5366376A (en) | 1976-11-26 | 1976-11-26 | Photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5366376A (US20110009641A1-20110113-C00185.png) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57179850A (en) * | 1981-04-30 | 1982-11-05 | Fujitsu Ltd | Keeping method for photo mask |
JPS5950444A (ja) * | 1982-09-16 | 1984-03-23 | Tokyo Ohka Kogyo Co Ltd | 微細加工用ホトマスク |
JPS61223842A (ja) * | 1985-03-29 | 1986-10-04 | Nec Kyushu Ltd | フオトマスク |
JPS6267548A (ja) * | 1985-09-20 | 1987-03-27 | Fujitsu Ltd | フオトマスク |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11321252B2 (en) | 2018-05-18 | 2022-05-03 | International Business Machines Corporation | Selecting a priority queue from which to process an input/output (I/O) request using a machine learning module |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131681A (US20110009641A1-20110113-C00185.png) * | 1973-04-20 | 1974-12-17 | ||
JPS5179575A (US20110009641A1-20110113-C00185.png) * | 1975-01-06 | 1976-07-10 | Hitachi Ltd |
-
1976
- 1976-11-26 JP JP14265876A patent/JPS5366376A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131681A (US20110009641A1-20110113-C00185.png) * | 1973-04-20 | 1974-12-17 | ||
JPS5179575A (US20110009641A1-20110113-C00185.png) * | 1975-01-06 | 1976-07-10 | Hitachi Ltd |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57179850A (en) * | 1981-04-30 | 1982-11-05 | Fujitsu Ltd | Keeping method for photo mask |
JPS5950444A (ja) * | 1982-09-16 | 1984-03-23 | Tokyo Ohka Kogyo Co Ltd | 微細加工用ホトマスク |
US4735890A (en) * | 1982-09-16 | 1988-04-05 | Tokyo Ohka Kogyo Kabushiki Kaisha | Photomasks for photolithographic fine patterning |
JPS61223842A (ja) * | 1985-03-29 | 1986-10-04 | Nec Kyushu Ltd | フオトマスク |
JPS6267548A (ja) * | 1985-09-20 | 1987-03-27 | Fujitsu Ltd | フオトマスク |
Also Published As
Publication number | Publication date |
---|---|
JPS5427707B2 (US20110009641A1-20110113-C00185.png) | 1979-09-11 |
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