JPS5350972A - Closed tube for heat treatment of multi-element semiconductor - Google Patents

Closed tube for heat treatment of multi-element semiconductor

Info

Publication number
JPS5350972A
JPS5350972A JP12595276A JP12595276A JPS5350972A JP S5350972 A JPS5350972 A JP S5350972A JP 12595276 A JP12595276 A JP 12595276A JP 12595276 A JP12595276 A JP 12595276A JP S5350972 A JPS5350972 A JP S5350972A
Authority
JP
Japan
Prior art keywords
heat treatment
element semiconductor
closed tube
sources
recess
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12595276A
Other languages
Japanese (ja)
Other versions
JPS5520377B2 (en
Inventor
Hiroshi Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12595276A priority Critical patent/JPS5350972A/en
Publication of JPS5350972A publication Critical patent/JPS5350972A/en
Publication of JPS5520377B2 publication Critical patent/JPS5520377B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To perfect the isolation between wafers and sources and reduce the production of lattice defects by providing a recess to an outer tube in the position away from multi-element semiconductor wafer accommodating part, providing a turn-back part for accommodating sources in the inner tube to be inserted therein and contacting the turn-back part to the recess of the outer tube to form double tubes.
COPYRIGHT: (C)1978,JPO&Japio
JP12595276A 1976-10-20 1976-10-20 Closed tube for heat treatment of multi-element semiconductor Granted JPS5350972A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12595276A JPS5350972A (en) 1976-10-20 1976-10-20 Closed tube for heat treatment of multi-element semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12595276A JPS5350972A (en) 1976-10-20 1976-10-20 Closed tube for heat treatment of multi-element semiconductor

Publications (2)

Publication Number Publication Date
JPS5350972A true JPS5350972A (en) 1978-05-09
JPS5520377B2 JPS5520377B2 (en) 1980-06-02

Family

ID=14923023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12595276A Granted JPS5350972A (en) 1976-10-20 1976-10-20 Closed tube for heat treatment of multi-element semiconductor

Country Status (1)

Country Link
JP (1) JPS5350972A (en)

Also Published As

Publication number Publication date
JPS5520377B2 (en) 1980-06-02

Similar Documents

Publication Publication Date Title
JPS5350972A (en) Closed tube for heat treatment of multi-element semiconductor
JPS5318967A (en) Wafer sucking jig
JPS5424571A (en) Manufacture for semiconductor wafer
JPS5373072A (en) Formation of oxidized film
JPS52127179A (en) Manufacturing method of semiconductor device
JPS5242365A (en) Tool for semiconductors
JPS52156552A (en) Wafer inspection apparatus
JPS53142185A (en) Manufacture of walled emitter type semiconductor device
JPS51148369A (en) Manufacturing method of semiconductor
JPS52155968A (en) Semiconductor wafer and its production
JPS52155969A (en) Reduced pressure heat treatment furnace of semiconductor wafers
JPS52149968A (en) Heat treatment method of semiconductor wafers
JPS5248469A (en) Process for production of semiconductor device
JPS52143759A (en) Impurity diffusion method for semiconductor wafers
JPS533061A (en) Semiconductor heat treatment method and members used for the same
JPS5377178A (en) Chuking device of semiconductor element substrate
JPS5478658A (en) Impurity diffusion method
JPS5358782A (en) Semiconductor device
JPS51148389A (en) Manufacturing method of semiconductor device
JPS5326663A (en) Manu facture of semiconductor device
JPS5379461A (en) Semiconductor device and its manufacturing process
JPS5424575A (en) Handling method of wafer
JPS5318976A (en) Production of semiconductor device
JPS5258478A (en) Wafer jig
JPS5211867A (en) Manufacturing method of a semiconductor device