JPS5348476A - Production of semiconductor device and production apparatus for the same - Google Patents
Production of semiconductor device and production apparatus for the sameInfo
- Publication number
- JPS5348476A JPS5348476A JP12365276A JP12365276A JPS5348476A JP S5348476 A JPS5348476 A JP S5348476A JP 12365276 A JP12365276 A JP 12365276A JP 12365276 A JP12365276 A JP 12365276A JP S5348476 A JPS5348476 A JP S5348476A
- Authority
- JP
- Japan
- Prior art keywords
- production
- same
- semiconductor device
- preventing
- production apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4587—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12365276A JPS5348476A (en) | 1976-10-14 | 1976-10-14 | Production of semiconductor device and production apparatus for the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12365276A JPS5348476A (en) | 1976-10-14 | 1976-10-14 | Production of semiconductor device and production apparatus for the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5348476A true JPS5348476A (en) | 1978-05-01 |
JPS579487B2 JPS579487B2 (ja) | 1982-02-22 |
Family
ID=14865901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12365276A Granted JPS5348476A (en) | 1976-10-14 | 1976-10-14 | Production of semiconductor device and production apparatus for the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5348476A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57157529A (en) * | 1981-03-24 | 1982-09-29 | Seiko Epson Corp | Semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4910296U (ja) * | 1972-05-01 | 1974-01-28 | ||
JPS5056154A (ja) * | 1973-09-14 | 1975-05-16 |
-
1976
- 1976-10-14 JP JP12365276A patent/JPS5348476A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4910296U (ja) * | 1972-05-01 | 1974-01-28 | ||
JPS5056154A (ja) * | 1973-09-14 | 1975-05-16 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57157529A (en) * | 1981-03-24 | 1982-09-29 | Seiko Epson Corp | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS579487B2 (ja) | 1982-02-22 |
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