JPS5341182A - Ion beam etching and its device - Google Patents

Ion beam etching and its device

Info

Publication number
JPS5341182A
JPS5341182A JP11543576A JP11543576A JPS5341182A JP S5341182 A JPS5341182 A JP S5341182A JP 11543576 A JP11543576 A JP 11543576A JP 11543576 A JP11543576 A JP 11543576A JP S5341182 A JPS5341182 A JP S5341182A
Authority
JP
Japan
Prior art keywords
ion beam
beam etching
secondary electron
mask
deformation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11543576A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5617821B2 (enrdf_load_stackoverflow
Inventor
Seitaro Matsuo
Akira Ozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP11543576A priority Critical patent/JPS5341182A/ja
Publication of JPS5341182A publication Critical patent/JPS5341182A/ja
Publication of JPS5617821B2 publication Critical patent/JPS5617821B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP11543576A 1976-09-28 1976-09-28 Ion beam etching and its device Granted JPS5341182A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11543576A JPS5341182A (en) 1976-09-28 1976-09-28 Ion beam etching and its device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11543576A JPS5341182A (en) 1976-09-28 1976-09-28 Ion beam etching and its device

Publications (2)

Publication Number Publication Date
JPS5341182A true JPS5341182A (en) 1978-04-14
JPS5617821B2 JPS5617821B2 (enrdf_load_stackoverflow) 1981-04-24

Family

ID=14662482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11543576A Granted JPS5341182A (en) 1976-09-28 1976-09-28 Ion beam etching and its device

Country Status (1)

Country Link
JP (1) JPS5341182A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5617821B2 (enrdf_load_stackoverflow) 1981-04-24

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