JPS5329674A - Photoresist applicator - Google Patents

Photoresist applicator

Info

Publication number
JPS5329674A
JPS5329674A JP10441776A JP10441776A JPS5329674A JP S5329674 A JPS5329674 A JP S5329674A JP 10441776 A JP10441776 A JP 10441776A JP 10441776 A JP10441776 A JP 10441776A JP S5329674 A JPS5329674 A JP S5329674A
Authority
JP
Japan
Prior art keywords
photoresist applicator
circumferential edge
applicator
photoresist
dropping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10441776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5337706B2 (enExample
Inventor
Takeshi Kawase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10441776A priority Critical patent/JPS5329674A/ja
Publication of JPS5329674A publication Critical patent/JPS5329674A/ja
Publication of JPS5337706B2 publication Critical patent/JPS5337706B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10441776A 1976-08-31 1976-08-31 Photoresist applicator Granted JPS5329674A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10441776A JPS5329674A (en) 1976-08-31 1976-08-31 Photoresist applicator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10441776A JPS5329674A (en) 1976-08-31 1976-08-31 Photoresist applicator

Publications (2)

Publication Number Publication Date
JPS5329674A true JPS5329674A (en) 1978-03-20
JPS5337706B2 JPS5337706B2 (enExample) 1978-10-11

Family

ID=14380106

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10441776A Granted JPS5329674A (en) 1976-08-31 1976-08-31 Photoresist applicator

Country Status (1)

Country Link
JP (1) JPS5329674A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4439243A (en) * 1982-08-03 1984-03-27 Texas Instruments Incorporated Apparatus and method of material removal with fluid flow within a slot
US4439244A (en) * 1982-08-03 1984-03-27 Texas Instruments Incorporated Apparatus and method of material removal having a fluid filled slot
US4685975A (en) * 1982-08-03 1987-08-11 Texas Instruments Incorporated Method for edge cleaning
US5058610A (en) * 1988-12-15 1991-10-22 Pioneer Electronic Corporation Fluid supplying and processing device
US5873380A (en) * 1994-03-03 1999-02-23 Mitsubishi Denki Kabushiki Kaisha Wafer cleaning apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4439243A (en) * 1982-08-03 1984-03-27 Texas Instruments Incorporated Apparatus and method of material removal with fluid flow within a slot
US4439244A (en) * 1982-08-03 1984-03-27 Texas Instruments Incorporated Apparatus and method of material removal having a fluid filled slot
US4685975A (en) * 1982-08-03 1987-08-11 Texas Instruments Incorporated Method for edge cleaning
US5058610A (en) * 1988-12-15 1991-10-22 Pioneer Electronic Corporation Fluid supplying and processing device
US5873380A (en) * 1994-03-03 1999-02-23 Mitsubishi Denki Kabushiki Kaisha Wafer cleaning apparatus

Also Published As

Publication number Publication date
JPS5337706B2 (enExample) 1978-10-11

Similar Documents

Publication Publication Date Title
JPS51111076A (en) Exposure device
JPS51120180A (en) Pattern printing device
JPS5329674A (en) Photoresist applicator
JPS5269072A (en) Device for positioning wheel
JPS5228267A (en) Minute processing
JPS5219070A (en) Distribution method
JPS525268A (en) Rotary coating device
JPS51139267A (en) Photo-mask
JPS521851A (en) Travelling apparatus
JPS52144971A (en) Spin coating device
JPS5338277A (en) Production of semiconductor device
JPS522164A (en) Wafer cleaning and drying device
JPS51117848A (en) Pattern resemblance calculator
JPS5216171A (en) Mask fitting device
JPS5221319A (en) Slime controlling agent
JPS51142795A (en) Grinding device
JPS52117072A (en) Hard mask
JPS5232108A (en) Sprayer
JPS527441A (en) Process for producing insecticide soaking plates
JPS5286071A (en) Metallic mask
JPS521360A (en) Plastics washer
JPS5240285A (en) Multiple operation instrument
JPS524346A (en) Running toy
JPS51113423A (en) Pattern input device
JPS51151086A (en) Semiconductor apparatus