JPS5328377A - Method of ion etching - Google Patents

Method of ion etching

Info

Publication number
JPS5328377A
JPS5328377A JP10282576A JP10282576A JPS5328377A JP S5328377 A JPS5328377 A JP S5328377A JP 10282576 A JP10282576 A JP 10282576A JP 10282576 A JP10282576 A JP 10282576A JP S5328377 A JPS5328377 A JP S5328377A
Authority
JP
Japan
Prior art keywords
ion etching
etching
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10282576A
Other languages
English (en)
Japanese (ja)
Other versions
JPS573213B2 (fr
Inventor
Jiyunichi Nishizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP10282576A priority Critical patent/JPS5328377A/ja
Publication of JPS5328377A publication Critical patent/JPS5328377A/ja
Priority to US05/924,066 priority patent/US4233109A/en
Priority to US06/166,700 priority patent/US4371412A/en
Publication of JPS573213B2 publication Critical patent/JPS573213B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP10282576A 1976-01-16 1976-08-27 Method of ion etching Granted JPS5328377A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10282576A JPS5328377A (en) 1976-08-27 1976-08-27 Method of ion etching
US05/924,066 US4233109A (en) 1976-01-16 1978-07-12 Dry etching method
US06/166,700 US4371412A (en) 1976-01-16 1980-07-03 Dry etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10282576A JPS5328377A (en) 1976-08-27 1976-08-27 Method of ion etching

Publications (2)

Publication Number Publication Date
JPS5328377A true JPS5328377A (en) 1978-03-16
JPS573213B2 JPS573213B2 (fr) 1982-01-20

Family

ID=14337788

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10282576A Granted JPS5328377A (en) 1976-01-16 1976-08-27 Method of ion etching

Country Status (1)

Country Link
JP (1) JPS5328377A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5781967A (en) * 1980-11-06 1982-05-22 Matsushita Electric Ind Co Ltd Feed roller for planetary system electrode wire feeder

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5781967A (en) * 1980-11-06 1982-05-22 Matsushita Electric Ind Co Ltd Feed roller for planetary system electrode wire feeder

Also Published As

Publication number Publication date
JPS573213B2 (fr) 1982-01-20

Similar Documents

Publication Publication Date Title
JPS51132972A (en) Method of etching
JPS5236979A (en) Method of etching
JPS533773A (en) Method of etching substrate
DE2862150D1 (en) Method for reactive ion etching of an element
JPS52141443A (en) Method of etching films
JPS532361A (en) Etching method
JPS5328378A (en) Method of plasma etching
JPS5289618A (en) Method of manufacturing 66aminocaproamide
JPS52114444A (en) Plasma etching method
JPS5285035A (en) Method of partially etching semiiconductors
JPS52137266A (en) Method of sputter etching
JPS5328377A (en) Method of ion etching
JPS5319315A (en) Method of etching
JPS5368642A (en) Plasma etching method
JPS536239A (en) Plasma etching method
JPS5290436A (en) Plasm etching method
JPS5328616A (en) Method of etching glasssferrite composite
JPS52141444A (en) Method of etching aluminum
JPS52133043A (en) Method of etching aluminum
JPS5357144A (en) Method of effecting etching of silicone
JPS52125430A (en) Ion etching method
JPS5367643A (en) Ionic etching method
JPS52108349A (en) Etching method
JPS52148305A (en) Etching method
JPS5323843A (en) Plasma etching method